Invention Grant
- Patent Title: Forming resistive random access memories together with fuse arrays
- Patent Title (中): 形成电阻随机存取存储器和熔丝阵列
-
Application No.: US14066308Application Date: 2013-10-29
-
Publication No.: US09136471B2Publication Date: 2015-09-15
- Inventor: Andrea Redaelli , Agostino Pirovano , Umberto M. Meotto , Giorgio Servalli
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Dorsey & Whitney LLP
- Main IPC: H01L21/82
- IPC: H01L21/82 ; H01L45/00 ; H01L27/24

Abstract:
A resistive random access memory array may be formed on the same substrate with a fuse array. The random access memory and the fuse array may use the same active material. For example, both the fuse array and the memory array may use a chalcogenide material as the active switching material. The main array may use a pattern of perpendicular sets of trench isolations and the fuse array may only use one set of parallel trench isolations. As a result, the fuse array may have a conductive line extending continuously between adjacent trench isolations. In some embodiments, this continuous line may reduce the resistance of the conductive path through the fuses.
Public/Granted literature
- US20140048763A1 FORMING RESISTIVE RANDOM ACCESS MEMORIES TOGETHER WITH FUSE ARRAYS Public/Granted day:2014-02-20
Information query
IPC分类: