Invention Grant
- Patent Title: Through silicon via repair circuit of semiconductor device
- Patent Title (中): 通过半导体器件的硅经修复电路
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Application No.: US14447531Application Date: 2014-07-30
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Publication No.: US09136843B2Publication Date: 2015-09-15
- Inventor: Pei-Ling Tseng , Keng-Li Su , Chih-Sheng Lin , Shyh-Shyuan Sheu
- Applicant: Industrial Technology Research Institute
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Priority: TW102142945A 20131126
- Main IPC: H03K19/00
- IPC: H03K19/00 ; H03K19/003 ; G01R31/28 ; H01L21/66

Abstract:
TSV repair circuit of a semiconductor device includes a first chip, a second chip, at least two TSV, at least two data path circuits and an output logic circuit. Each data path circuit comprises an input driving circuit, a TSV detection circuit, a memory device, a protection circuit and a power control circuit. The TSV detection circuit detects a TSV status, the memory device keeps the TSV status, the protection circuit determines whether to pull a first end of the TSV to a ground voltage according to the TSV status, and the power control circuit prevents a leakage current of a power voltage from flowing through a substrate.
Public/Granted literature
- US20140340113A1 THROUGH SILICON VIA REPAIR CIRCUIT OF SEMICONDUCTOR DEVICE Public/Granted day:2014-11-20
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