Invention Grant
- Patent Title: Thin polishing pad with window and molding process
- Patent Title (中): 薄型抛光垫带有窗口和成型工艺
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Application No.: US13948547Application Date: 2013-07-23
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Publication No.: US09138858B2Publication Date: 2015-09-22
- Inventor: Dominic J. Benvegnu , Jimin Zhang , Thomas H. Osterheld , Boguslaw A. Swedek
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: B24B37/26
- IPC: B24B37/26 ; B24B49/12 ; B24B37/20 ; B24B37/013

Abstract:
A polishing pad is described that has a polishing layer with a polishing surface, an adhesive layer on a side of the polishing layer opposite the polishing layer, and a solid light-transmitting window extending through and molded to the polishing layer. The window has a top surface coplanar with the polishing surface and a bottom surface coplanar with a lower surface of the adhesive layer. A method of making a polishing pad includes forming an aperture through a polishing layer and an adhesive layer, securing a backing piece to the adhesive layer on a side opposite a polishing surface of the polishing layer, dispensing a liquid polymer into the aperture, and curing the liquid polymer to form a window.
Public/Granted literature
- US20130309951A1 THIN POLISHING PAD WITH WINDOW AND MOLDING PROCESS Public/Granted day:2013-11-21
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