Invention Grant
US09140539B2 Optical system and method for measurement of one or more parameters of via-holes
有权
用于测量通孔的一个或多个参数的光学系统和方法
- Patent Title: Optical system and method for measurement of one or more parameters of via-holes
- Patent Title (中): 用于测量通孔的一个或多个参数的光学系统和方法
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Application No.: US14021010Application Date: 2013-09-09
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Publication No.: US09140539B2Publication Date: 2015-09-22
- Inventor: David Scheiner
- Applicant: NOVA MEASURING INSTRUMENTS LTD.
- Applicant Address: IL Rehovot
- Assignee: NOVA MEASURING INSTRUMENTS LTD.
- Current Assignee: NOVA MEASURING INSTRUMENTS LTD.
- Current Assignee Address: IL Rehovot
- Agency: AlphaPatent Associates Ltd.
- Agent Daniel J. Swirsky
- Priority: IL188029 20071210
- Main IPC: G01B11/00
- IPC: G01B11/00 ; G01B11/22 ; G01B11/24 ; G01R31/28 ; G06T7/00 ; G01B11/02 ; G01B11/08 ; G01B11/12 ; G01R31/311 ; H01L21/66

Abstract:
Obtaining at least one of a cross-section profile, depth, width, slope, undercut and other parameters of via-holes by a non-destructive technique using an optical system having an illumination system for producing at least one light beam and directing it on a sample in a region of the structure containing at least one via-hole, a detection system configured and operable to collect a pattern of light reflected from the illuminated region, the light pattern being indicative of one or more parameters of said via-hole, and, a control system connected to the detection system, the control system comprising a memory utility for storing a predetermined theoretical model comprising data representative of a set of parameters describing via-holes reflected pattern, and a data processing and analyzing utility configured and operable to receive and analyze image data indicative of the detected light pattern and determine one or more parameters of said via-hole.
Public/Granted literature
- US20140376006A1 OPTICAL SYSTEM AND METHOD FOR MEASUREMENT OF ONE OR MORE PARAMETERS OF VIA-HOLES Public/Granted day:2014-12-25
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