Invention Grant
- Patent Title: Method for generating layout pattern
- Patent Title (中): 生成布局模式的方法
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Application No.: US13968391Application Date: 2013-08-15
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Publication No.: US09141744B2Publication Date: 2015-09-22
- Inventor: Po-Chao Tsao , Shih-Fang Hong , Chia-Wei Huang , Ming-Jui Chen , Shih-Fang Tzou , Ming-Te Wei
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Science-Based Industrial Park, Hsin-Chu
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Science-Based Industrial Park, Hsin-Chu
- Agent Winston Hsu; Scott Margo
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G03F1/00

Abstract:
A method for generating a layout pattern is provided. First, a layout pattern is provided to a computer system and is classified into two sub-patterns and a blank pattern. Each of the sub-patterns has pitches in simple integer ratios and the blank pattern is between the two sub-patterns. Then, a plurality of first stripe patterns and at least two second stripe patterns are generated. The edges of the first stripe patterns are aligned with the edges of the sub-patterns and the first stripe patterns have equal spacings and widths. The spacings or widths of the second stripe patterns are different from that of the first stripe patterns.
Public/Granted literature
- US20150052491A1 METHOD FOR GENERATING LAYOUT PATTERN Public/Granted day:2015-02-19
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