Invention Grant
- Patent Title: Capacitively coupled remote plasma source
- Patent Title (中): 电容耦合远程等离子体源
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Application No.: US14227583Application Date: 2014-03-27
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Publication No.: US09142388B2Publication Date: 2015-09-22
- Inventor: Daniel J. Hoffman , Daniel Carter , Victor Brouk , Karen Peterson , Randy Grilley
- Applicant: Advanced Energy Industries, Inc.
- Applicant Address: US CO Fort Collins
- Assignee: Advanced Energy Industries, Inc.
- Current Assignee: Advanced Energy Industries, Inc.
- Current Assignee Address: US CO Fort Collins
- Agency: Neugeboren O'Dowd PC
- Main IPC: H01J7/24
- IPC: H01J7/24 ; H01J37/32 ; H05H1/46

Abstract:
This disclosure describes systems, methods, and apparatus for capacitively coupling energy into a plasma to ignite and sustain the plasma within a remote plasma source. The power is provided by a first electrode that at least partially surrounds or is surrounded by a second electrode. The second electrode can be grounded or floating. First and second dielectric components can be arranged to separate one or both of the electrodes from the plasma and thereby DC isolate the plasma from one or both of the electrodes.
Public/Granted literature
- US20140210345A1 CAPACITIVELY COUPLED REMOTE PLASMA SOURCE Public/Granted day:2014-07-31
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