Invention Grant
- Patent Title: Light source tracking in optical metrology system
- Patent Title (中): 光学测量系统中的光源跟踪
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Application No.: US13285712Application Date: 2011-10-31
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Publication No.: US09146156B2Publication Date: 2015-09-29
- Inventor: Guorong V. Zhuang , Shankar Krishnan , Johannes D. de Veer , Klaus Flock , David Y. Wang , Lawrence D. Rotter
- Applicant: Guorong V. Zhuang , Shankar Krishnan , Johannes D. de Veer , Klaus Flock , David Y. Wang , Lawrence D. Rotter
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz pc llo
- Main IPC: G01B11/26
- IPC: G01B11/26 ; G01J3/02 ; G01N21/47 ; G01J3/06 ; G01J3/10

Abstract:
The present invention may include loading a diagnostic sample onto a sample stage, focusing light from an illumination source disposed on a multi-axis stage onto the diagnostic sample, collecting a portion of light reflected from a surface of the diagnostic sample utilizing a detector, wherein the illumination source and the detector are optically direct-coupled via an optical system, acquiring a set of diagnostic parameters indicative of illumination source position drift from the diagnostic sample, determining a magnitude of the illumination source position drift by comparing the acquired set of diagnostic parameters to an initial set of parameters obtained from the diagnostic sample at a previously measured alignment condition, determining a direction of the illumination source position drift; and providing illumination source position adjustment parameters configured to correct the determined magnitude and direction of the illumination source position drift to the multi-axis actuation control system of the multi-axis stage.
Public/Granted literature
- US20130033704A1 LIGHT SOURCE TRACKING IN OPTICAL METROLOGY SYSTEM Public/Granted day:2013-02-07
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