Optical system polarizer calibration
    2.
    发明授权
    Optical system polarizer calibration 有权
    光学系统偏光镜校准

    公开(公告)号:US08570514B2

    公开(公告)日:2013-10-29

    申请号:US13164130

    申请日:2011-06-20

    CPC classification number: G01N21/21 G01J3/504 G01N21/274

    Abstract: A method to calibrate a polarizer in polarized optical system at any angle of incidence, by decoupling the calibration from a polarization effect of the system, by providing a calibration apparatus that includes a substrate having a polarizer disposed on a surface thereof, with an indicator on the substrate for indicating a polarization orientation of the polarizer, loading the calibration apparatus in the polarized optical system with the indicator in a desired position, determining an initial angle between the polarization orientation and a reference of the polarized optical system, acquiring spectra using the polarized optical system at a plurality of known angles between the polarization orientation and the reference of the polarized optical system, using the spectra to plot a curve indicating an angle of the polarizer in the polarized optical system, and when the angle of the polarizer is outside of a desired range, adjusting the angle of the polarizer, and repeating the steps of acquiring the spectra, and plotting a curve indicating the angle of the polarizer.

    Abstract translation: 一种通过提供校准装置来校准偏振光学系统中任何入射角的偏振器的方法,通过提供校准装置,该校准装置包括具有设置在其表面上的偏振器的衬底, 用于指示偏振器的偏振取向的衬底,将校准装置装载在具有指示器的期望位置的偏振光学系统中,确定极化取向和偏振光学系统的基准之间的初始角度,使用偏振光 光学系统以偏振方向和偏振光学系统的基准之间的多个已知角度,使用光谱绘制指示偏振器在偏振光学系统中的角度的曲线,以及当偏振器的角度在 期望的范围,调节偏振器的角度,并重复以下步骤 获取光谱,并绘制一个指示偏振片角度的曲线。

    Optical film topography and thickness measurement
    3.
    发明授权
    Optical film topography and thickness measurement 有权
    光学薄膜形貌和厚度测量

    公开(公告)号:US06999180B1

    公开(公告)日:2006-02-14

    申请号:US10405528

    申请日:2003-04-02

    CPC classification number: G01B11/0675 G01B11/2441

    Abstract: An apparatus capable of measuring topography and transparent film thickness of a patterned metal-dielectric layer on a substrate without contact with the layer. A broadband interferometer measures an absolute phase of reflection at a plurality of wavelengths from a plurality of locations within a field of view on the metal-dielectric patterned layer on the substrate, and produces reflection phase data. An analyzer receives the reflection phase data and regresses the transparent film thickness and the topography at each of the plurality of locations from the reflection phase data. In this manner, the apparatus is not confused by the phase changes produced in the reflected light by the transparent layers, because the thickness of the transparent layers are determined by using the reflection phase data from multiple wavelengths. Further, the surface topography of the layer, whether it be opaque or transparent is also determinable. Thus, the present invention provides a means by which both transparent layer thickness and topography can be determined on an array surface of transparent and opaque layers, without contacting the surface of the layers.

    Abstract translation: 一种能够测量衬底上图案化的金属 - 电介质层的形貌和透明膜厚度而不与该层接触的装置。 宽带干涉仪测量在基板上的金属 - 电介质图案层上的视场内的多个位置处的多个波长的绝对相位反射,并产生反射相位数据。 分析仪从反射相位数据接收反射相位数据并且在多个位置的每一个处回归透明膜厚度和形貌。 以这种方式,由于通过使用来自多个波长的反射相位数据来确定透明层的厚度,所以该装置不会被由透明层产生的反射光产生的相位变化所困惑。 此外,层的表面形貌,无论是不透明还是透明,也是可以确定的。 因此,本发明提供了一种在透明层和不透明层的阵列表面上可以确定透明层厚度和形貌的手段,而不与层的表面接触。

    Selectably configurable multiple mode spectroscopic ellipsometry
    4.
    发明授权
    Selectably configurable multiple mode spectroscopic ellipsometry 有权
    可选择配置的多模光谱椭偏仪

    公开(公告)号:US09404872B1

    公开(公告)日:2016-08-02

    申请号:US13538552

    申请日:2012-06-29

    Abstract: The present invention may include an illumination source configured to illuminate a surface of a sample, a detector configured to detect at least a portion of light reflected from the surface of the sample, a selectably configurable optical system comprising: a rotatable polarizing element disposed in the illumination arm of the optical system, an analyzing element disposed in the collection arm of the optical system, and a rotatable-translatable compensator element disposed in the collection arm of the optical system, and a control system communicatively configured to selectably configure the optical system in the a rotating compensator (RCSE) mode, a rotating polarizer (RPSE) mode, or a rotating polarizer and compensator (RPRC) mode.

    Abstract translation: 本发明可以包括被配置为照亮样品的表面的照明源,被配置为检测从样品的表面反射的光的至少一部分的检测器,可选择地配置的光学系统,包括:可旋转偏振元件,其设置在 光学系统的照明臂,设置在光学系统的收集臂中的分析元件和设置在光学系统的收集臂中的可旋转平移补偿元件,以及通信地配置为可选择地将光学系统配置在 旋转补偿器(RCSE)模式,旋转偏振器(RPSE)模式或旋转偏振器和补偿器(RPRC)模式。

    Light source tracking in optical metrology system
    6.
    发明授权
    Light source tracking in optical metrology system 有权
    光学测量系统中的光源跟踪

    公开(公告)号:US09146156B2

    公开(公告)日:2015-09-29

    申请号:US13285712

    申请日:2011-10-31

    Abstract: The present invention may include loading a diagnostic sample onto a sample stage, focusing light from an illumination source disposed on a multi-axis stage onto the diagnostic sample, collecting a portion of light reflected from a surface of the diagnostic sample utilizing a detector, wherein the illumination source and the detector are optically direct-coupled via an optical system, acquiring a set of diagnostic parameters indicative of illumination source position drift from the diagnostic sample, determining a magnitude of the illumination source position drift by comparing the acquired set of diagnostic parameters to an initial set of parameters obtained from the diagnostic sample at a previously measured alignment condition, determining a direction of the illumination source position drift; and providing illumination source position adjustment parameters configured to correct the determined magnitude and direction of the illumination source position drift to the multi-axis actuation control system of the multi-axis stage.

    Abstract translation: 本发明可以包括将诊断样本加载到样本台上,将来自设置在多轴平台上的照明源的光聚焦到诊断样本上,利用检测器收集从诊断样品的表面反射的一部分光,其中 照明源和检测器通过光学系统光学直接耦合,获取指示来自诊断样本的照明源位置漂移的一组诊断参数,通过比较所获取的诊断参数集合来确定照明源位置漂移的大小 到在先前测量的对准条件下从诊断样本获得的初始参数集合,确定照明源位置漂移的方向; 以及提供照明源位置调整参数,其被配置为校正所确定的照明源位置漂移的大小和方向到所述多轴平台的多轴致动控制系统。

    LIGHT SOURCE TRACKING IN OPTICAL METROLOGY SYSTEM
    7.
    发明申请
    LIGHT SOURCE TRACKING IN OPTICAL METROLOGY SYSTEM 有权
    光学系统系统中的光源跟踪

    公开(公告)号:US20130033704A1

    公开(公告)日:2013-02-07

    申请号:US13285712

    申请日:2011-10-31

    Abstract: The present invention may include loading a diagnostic sample onto a sample stage, focusing light from an illumination source disposed on a multi-axis stage onto the diagnostic sample, collecting a portion of light reflected from a surface of the diagnostic sample utilizing a detector, wherein the illumination source and the detector are optically direct-coupled via an optical system, acquiring a set of diagnostic parameters indicative of illumination source position drift from the diagnostic sample, determining a magnitude of the illumination source position drift by comparing the acquired set of diagnostic parameters to an initial set of parameters obtained from the diagnostic sample at a previously measured alignment condition, determining a direction of the illumination source position drift; and providing illumination source position adjustment parameters configured to correct the determined magnitude and direction of the illumination source position drift to the multi-axis actuation control system of the multi-axis stage.

    Abstract translation: 本发明可以包括将诊断样本加载到样本台上,将来自设置在多轴平台上的照明源的光聚焦到诊断样本上,利用检测器收集从诊断样品的表面反射的一部分光,其中 照明源和检测器通过光学系统光学直接耦合,获取指示来自诊断样本的照明源位置漂移的一组诊断参数,通过比较所获取的诊断参数集合来确定照明源位置漂移的大小 到在先前测量的对准条件下从诊断样本获得的初始参数集合,确定照明源位置漂移的方向; 以及提供照明源位置调整参数,其被配置为校正所确定的照明源位置漂移的大小和方向到所述多轴平台的多轴致动控制系统。

    Optical System Polarizer Calibration
    8.
    发明申请
    Optical System Polarizer Calibration 有权
    光学系统偏振器校准

    公开(公告)号:US20120320377A1

    公开(公告)日:2012-12-20

    申请号:US13164130

    申请日:2011-06-20

    CPC classification number: G01N21/21 G01J3/504 G01N21/274

    Abstract: A method to calibrate a polarizer in polarized optical system at any angle of incidence, by decoupling the calibration from a polarization effect of the system, by providing a calibration apparatus that includes a substrate having a polarizer disposed on a surface thereof, with an indicator on the substrate for indicating a polarization orientation of the polarizer, loading the calibration apparatus in the polarized optical system with the indicator in a desired position, determining an initial angle between the polarization orientation and a reference of the polarized optical system, acquiring spectra using the polarized optical system at a plurality of known angles between the polarization orientation and the reference of the polarized optical system, using the spectra to plot a curve indicating an angle of the polarizer in the polarized optical system, and when the angle of the polarizer is outside of a desired range, adjusting the angle of the polarizer, and repeating the steps of acquiring the spectra, and plotting a curve indicating the angle of the polarizer.

    Abstract translation: 一种通过提供校准装置来校准偏振光学系统中任何入射角的偏振器的方法,通过提供校准装置,该校准装置包括具有设置在其表面上的偏振器的衬底, 用于指示偏振器的偏振取向的衬底,将校准装置装载在具有指示器的期望位置的偏振光学系统中,确定极化取向和偏振光学系统的基准之间的初始角度,使用偏振光 光学系统以偏振方向和偏振光学系统的基准之间的多个已知角度,使用光谱绘制指示偏振器在偏振光学系统中的角度的曲线,以及当偏振器的角度在 期望的范围,调节偏振器的角度,并重复以下步骤 获取光谱,并绘制一个指示偏振片角度的曲线。

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