Invention Grant
- Patent Title: Bridge interconnection with layered interconnect structures
- Patent Title (中): 桥接互连与分层互连结构
-
Application No.: US13903828Application Date: 2013-05-28
-
Publication No.: US09147663B2Publication Date: 2015-09-29
- Inventor: Yueli Liu , Qinglei Zhang , Amanda E. Schuckman , Rui Zhang
- Applicant: INTEL CORPORATION
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Schwabe, Williamson & Wyatt, P.C.
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01L23/538 ; H01L23/482 ; H01L25/065

Abstract:
Embodiments of the present disclosure are directed towards techniques and configurations for layered interconnect structures for bridge interconnection in integrated circuit assemblies. In one embodiment, an apparatus may include a substrate and a bridge embedded in the substrate. The bridge may be configured to route electrical signals between two dies. An interconnect structure, electrically coupled with the bridge, may include a via structure including a first conductive material, a barrier layer including a second conductive material disposed on the via structure, and a solderable material including a third conductive material disposed on the barrier layer. The first conductive material, the second conductive material, and the third conductive material may have different chemical composition. Other embodiments may be described and/or claimed.
Public/Granted literature
- US20140353827A1 BRIDGE INTERCONNECTION WITH LAYERED INTERCONNECT STRUCTURES Public/Granted day:2014-12-04
Information query
IPC分类: