发明授权
US09152048B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition 有权
光化学射线或辐射敏感性树脂组合物和使用该组合物形成图案的方法

Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition
摘要:
According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes (A) a resin that when acted on by an acid, increases its solubility in an alkali developer, (B) a compound that when exposed to actinic rays or radiation, generates an acid, and (C) a resin containing at least one group selected from among the following groups (x) to (z) and further containing at least either a fluorine atom or a silicon atom, in which three or more polymer chains are contained through at least one branch point, (x) an alkali-soluble group, (y) a group that when acted on by an alkali developer, is decomposed to thereby increase its solubility in the alkali developer, and (z) a group that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer.
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