发明授权
US09152048B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition
有权
光化学射线或辐射敏感性树脂组合物和使用该组合物形成图案的方法
- 专利标题: Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition
- 专利标题(中): 光化学射线或辐射敏感性树脂组合物和使用该组合物形成图案的方法
-
申请号: US12905742申请日: 2010-10-15
-
公开(公告)号: US09152048B2公开(公告)日: 2015-10-06
- 发明人: Hiroshi Saegusa , Kaoru Iwato , Yusuke Iizuka , Kousuke Koshijima
- 申请人: Hiroshi Saegusa , Kaoru Iwato , Yusuke Iizuka , Kousuke Koshijima
- 申请人地址: JP Tokyo
- 专利权人: FUJIFILM Corporation
- 当前专利权人: FUJIFILM Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Sughrue Mion, PLLC
- 优先权: JP2009-238284 20091015
- 主分类号: G03F7/004
- IPC分类号: G03F7/004 ; G03F7/38 ; G03F7/039 ; G03F7/075 ; G03F7/20
摘要:
According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes (A) a resin that when acted on by an acid, increases its solubility in an alkali developer, (B) a compound that when exposed to actinic rays or radiation, generates an acid, and (C) a resin containing at least one group selected from among the following groups (x) to (z) and further containing at least either a fluorine atom or a silicon atom, in which three or more polymer chains are contained through at least one branch point, (x) an alkali-soluble group, (y) a group that when acted on by an alkali developer, is decomposed to thereby increase its solubility in the alkali developer, and (z) a group that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer.
公开/授权文献
信息查询
IPC分类: