发明授权
- 专利标题: Methods of forming wirings in electronic devices
- 专利标题(中): 在电子设备中形成布线的方法
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申请号: US13601658申请日: 2012-08-31
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公开(公告)号: US09153487B2公开(公告)日: 2015-10-06
- 发明人: Seung-ho Lee , Young-ki Hong , Sung-gyu Kang , Joong-hyuk Kim , Jae-woo Chung
- 申请人: Seung-ho Lee , Young-ki Hong , Sung-gyu Kang , Joong-hyuk Kim , Jae-woo Chung
- 申请人地址: KR Gyeonggi-Do
- 专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人地址: KR Gyeonggi-Do
- 代理机构: Harness, Dickey & Pierce, PLC
- 优先权: KR10-2011-0141720 20111223
- 主分类号: H01L21/285
- IPC分类号: H01L21/285 ; H01L21/768 ; H01L21/311 ; H01L27/12
摘要:
A method of forming a wiring may include forming a first wire on a substrate; forming a material layer on the substrate, except on the first wire; forming a surface treatment film on the material layer; and forming a second wire on the first wire. The surface treatment film has physical properties opposite to the first wire. A method of forming a wiring may include forming a first wire on a substrate; forming a material layer on the substrate and the first wire; removing a portion of the material layer from the first wire; forming a surface treatment film on the material layer and the first wire; removing a portion of the surface treatment film from the first wire; and forming a second wire on the first wire. A thickness of the material layer on the substrate is greater than a thickness of the first wire on the substrate.
公开/授权文献
- US20130164932A1 METHODS OF FORMING WIRINGS IN ELECTRONIC DEVICES 公开/授权日:2013-06-27
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