发明授权
- 专利标题: Microelectronic devices having conductive through via electrodes insulated by gap regions
- 专利标题(中): 具有通过间隙区域绝缘的导电通孔的微电子器件
-
申请号: US13474992申请日: 2012-05-18
-
公开(公告)号: US09153489B2公开(公告)日: 2015-10-06
- 发明人: Ho-Jin Lee , Byung Lyul Park , SeYoung Jeong , Hyunsoo Chung , Gilheyun Choi
- 申请人: Ho-Jin Lee , Byung Lyul Park , SeYoung Jeong , Hyunsoo Chung , Gilheyun Choi
- 申请人地址: KR
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR
- 代理机构: Myers Bigel Sibley & Sajovec, PA
- 优先权: KR10-2011-0047450 20110519
- 主分类号: H01L23/48
- IPC分类号: H01L23/48 ; H01L23/52 ; H01L29/40 ; H01L21/768
摘要:
A microelectronic device includes a substrate having a trench extending therethrough between an active surface thereof and an inactive surface thereof opposite the active surface, a conductive via electrode extending through the substrate between sidewalls of the trench, and an insulating layer extending along the inactive surface of the substrate outside the trench and extending at least partially into the trench. The insulating layer defines a gap region in the trench that separates the substrate and the via electrode. Related devices and methods of fabrication are also discussed.
公开/授权文献
信息查询
IPC分类: