Invention Grant
- Patent Title: Apparatuses including electrodes having a conductive barrier material and methods of forming same
- Patent Title (中): 包括具有导电阻挡材料的电极的装置及其形成方法
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Application No.: US13776485Application Date: 2013-02-25
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Publication No.: US09166158B2Publication Date: 2015-10-20
- Inventor: Swapnil A. Lengade , John M. Meldrim , Andrea Gotti
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Dorsey & Whitney LLP
- Main IPC: H01L47/00
- IPC: H01L47/00 ; H01L45/00 ; H01L27/24

Abstract:
Apparatuses and methods of manufacture are disclosed for phase change memory cell electrodes having a conductive barrier material. In one example, an apparatus includes a first chalcogenide structure and a second chalcogenide structure stacked together with the first chalcogenide structure. A first electrode portion is coupled to the first chalcogenide structure, and a second electrode portion is coupled to the second chalcogenide structure. An electrically conductive barrier material is disposed between the first and second electrode portions.
Public/Granted literature
- US20140239245A1 APPARATUSES INCLUDING ELECTRODES HAVING A CONDUCTIVE BARRIER MATERIAL AND METHODS OF FORMING SAME Public/Granted day:2014-08-28
Information query
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