Invention Grant
- Patent Title: Beam position control for an extreme ultraviolet light source
- Patent Title (中): 用于极紫外光源的光束位置控制
-
Application No.: US14658417Application Date: 2015-03-16
-
Publication No.: US09167679B2Publication Date: 2015-10-20
- Inventor: Vladimir B. Fleurov , Igor V. Fomenkov
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: DiBerardino McGovern IP Group LLC
- Main IPC: H05G2/00
- IPC: H05G2/00 ; G21K5/00 ; G21K5/10

Abstract:
A system for an extreme ultraviolet light source includes one or more optical elements positioned to receive a reflected amplified light beam and to direct the reflected amplified light beam into first, second, and third channels, the reflected amplified light beam including a reflection of at least a portion of an irradiating amplified light beam that interacts with a target material; a first sensor that senses light from the first channel; a second sensor that senses light from the second channel and the third channel, the second sensor having a lower acquisition rate than the first sensor; and an electronic processor coupled to a computer-readable storage medium, the medium storing instructions that, when executed, cause the processor to: receive data from the first sensor and the second sensor, and determine, based on the received data, a location of the irradiating amplified light beam relative to the target material in more than one dimension.
Public/Granted literature
- US20150257246A1 BEAM POSITION CONTROL FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE Public/Granted day:2015-09-10
Information query