发明授权
- 专利标题： Silicon-containing film-forming composition, silicon-containing film, and pattern forming method
- 专利标题（中）： 含硅成膜组合物，含硅膜和图案形成方法
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申请号： US12722529申请日： 2010-03-12
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公开(公告)号： US09170492B2公开(公告)日： 2015-10-27
- 发明人: Tomoharu Kawazu , Masato Tanaka , Takashi Mori , Kazunori Takanashi , Kyoyu Yasuda
- 申请人： Tomoharu Kawazu , Masato Tanaka , Takashi Mori , Kazunori Takanashi , Kyoyu Yasuda
- 申请人地址： JP Tokyo
- 专利权人： JSR CORPORATION
- 当前专利权人： JSR CORPORATION
- 当前专利权人地址： JP Tokyo
- 代理机构： Oblon, McClelland, Maier & Neustadt, L.L.P.
- 优先权： JP2009-061907 20090313
- 主分类号： G03F7/075
- IPC分类号： G03F7/075 ; G03F7/09 ; G03F7/30 ; G03F7/36 ; C08G77/04 ; C08G77/00
摘要：
A silicon-containing film-forming composition includes a polysiloxane and organic solvent. The polysiloxane includes a first structural unit, a second structural unit, and a third structural unit. The first structural unit is derived from a tetraalkoxysilane. The second structural unit is derived from a compound shown by a formula (1), wherein R1 represents a hydrogen atom or an electron-donating group, at least one R1 is an electron-donating group, R2 represents a monovalent organic group, and n represents 0 or 1. The third structural unit is derived from a compound shown by a formula (2), wherein R3 represents an alkyl group having 1 to 8 carbon atoms, and R4 represents a monovalent organic group.
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