摘要:
A silicon-containing film-forming composition includes a polysiloxane and organic solvent. The polysiloxane includes a first structural unit, a second structural unit, and a third structural unit. The first structural unit is derived from a tetraalkoxysilane. The second structural unit is derived from a compound shown by a formula (1), wherein R1 represents a hydrogen atom or an electron-donating group, at least one R1 is an electron-donating group, R2 represents a monovalent organic group, and n represents 0 or 1. The third structural unit is derived from a compound shown by a formula (2), wherein R3 represents an alkyl group having 1 to 8 carbon atoms, and R4 represents a monovalent organic group.
摘要:
A silicon-containing film-forming composition includes a polysiloxane and organic solvent. The polysiloxane includes a first structural unit, a second structural unit, and a third structural unit. The first structural unit is derived from a tetraalkoxysilane. The second structural unit is derived from a compound shown by a formula (1), wherein R1 represents a hydrogen atom or an electron-donating group, at least one R1 is an electron-donating group, R2 represents a monovalent organic group, and n represents 0 or 1. The third structural unit is derived from a compound shown by a formula (2), wherein R3 represents an alkyl group having 1 to 8 carbon atoms, and R4 represents a monovalent organic group.
摘要:
A resist pattern-forming method includes applying a resist underlayer film-forming composition to a substrate to form a resist underlayer film. The resist underlayer film-forming composition includes (A) a polysiloxane. A radiation-sensitive resin composition is applied to the resist underlayer film to form a resist film. The radiation-sensitive resin composition includes (a1) a polymer that changes in polarity and decreases in solubility in an organic solvent due to an acid. The resist film is exposed. The exposed resist film is developed using a developer that includes an organic solvent.
摘要:
A resist pattern-forming method includes applying a resist underlayer film-forming composition to a substrate to form a resist underlayer film. The resist underlayer film-forming composition includes (A) a polysiloxane. A radiation-sensitive resin composition is applied to the resist underlayer film to form a resist film. The radiation-sensitive resin composition includes (a1) a polymer that changes in polarity and decreases in solubility in an organic solvent due to an acid. The resist film is exposed. The exposed resist film is developed using a developer that includes an organic solvent.
摘要:
A pattern-forming method includes forming a silicon-containing film on a substrate, the silicon-containing film having a mass ratio of silicon atoms to carbon atoms of 2 to 12. A shape transfer target layer is formed on the silicon-containing film. A fine pattern is transferred to the shape transfer target layer using a stamper that has a fine pattern to form a resist pattern. The silicon-containing film and the substrate are dry-etched using the resist pattern as a mask to form a pattern on the substrate in nanoimprint lithography. According to another aspect of the invention, a silicon-containing film includes silicon atoms and carbon atoms. A mass ratio of silicon atoms to carbon atoms is 2 to 12. The silicon-containing film is used for a pattern-forming method employed in nanoimprint lithography.
摘要:
A metal member includes a first layer and a second layer. The second layer has an average crystal grain size different from an average crystal grain size of the first layer. An intermediate layer having an average crystal grain size smaller than the average crystal grain sizes of the first layer and the second layer is interposed between the first layer and the second layer.
摘要:
A channel substrate includes a plurality of individual channels and a plurality of linear machining marks. The plurality of individual channels is arrayed in row. The plurality of linear machining marks is substantially parallel to a direction in which the plurality of individual channels is arrayed in row.
摘要:
In a printing blanket, a manufacturing method of the printing blanket, a blanket cylinder, and a printing press, a printing unit is configured to include a plate cylinder to which a plate is attached, and a blanket cylinder that has a blanket attached thereto, rotates synchronously with the plate cylinder, and can transfer an ink image transferred from the plate cylinder onto a web, a circumference of the blanket cylinder is set to be twice as large as a circumference of the plate cylinder, and a notch and a concave portion along an axial direction are provided on a surface of the blanket at a uniform interval to correspond to a notch of the plate cylinder.
摘要:
An image processor includes an encoding unit encoding inputted data. The encoding unit includes a first processing unit splitting the data into a first partial data in a first digit range on an upper side and a second partial data in a second digit range on a lower side, a second processing unit encoding only the first partial data between the first partial data and the second partial data, and a third processing unit performing correction to set a value of the first partial data at “0”.
摘要:
A smart entry system for a vehicle having a lockable trunk is provided. The smart entry system includes portable devices, an onboard transmitter for transmitting request signals to the portable devices, an onboard receiver for receiving identification signals from the portable devices, and a trunk lockout protection feature. The trunk lockout protection feature is configured to receive a command signal to either initiate a trunk lockout protection sequence to unlock the trunk in the event that one of the portable devices is locked in the trunk or to disable the trunk lockout protection sequence to permit the trunk to remain in a locked state in the event that one of the portable devices is locked in the trunk.