Invention Grant
- Patent Title: System and method for die to die stress improvement
- Patent Title (中): 模具应力改善的系统和方法
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Application No.: US13717883Application Date: 2012-12-18
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Publication No.: US09171759B2Publication Date: 2015-10-27
- Inventor: Chia-Pin Cheng , Jung-Liang Chien , Chih-Kang Chao , Chi-Cherng Jeng , Hsin-Chi Chen , Ying-Lang Wang
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Duane Morris LLP
- Main IPC: H01L21/78
- IPC: H01L21/78 ; H01L23/00 ; H01L23/58 ; H01L21/66

Abstract:
A semiconductor wafer having a plurality of chip die areas arranged on a wafer in an array, each chip die area including a seal ring area with one or more first sets of polygonal structures. The wafer further comprises scribe line areas between the chip die areas, the scribe line areas including one or more second sets of polygonal structures. The presence of proximate polygonal structures between the scribe line and seal ring areas balance stresses between the chip die areas during wafer dicing operation.
Public/Granted literature
- US20140167199A1 SYSTEM AND METHOD FOR DIE TO DIE STRESS IMPROVEMENT Public/Granted day:2014-06-19
Information query
IPC分类: