Invention Grant
- Patent Title: Semiconductor laser structure
- Patent Title (中): 半导体激光器结构
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Application No.: US14472400Application Date: 2014-08-29
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Publication No.: US09171779B2Publication Date: 2015-10-27
- Inventor: Jui-Ying Lin , Yen-Hsiang Fang , Chia-Hsin Chao , Yao-Jun Tsai , Yi-Chen Lin
- Applicant: Industrial Technology Research Institute
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Agency: Jianq Chyun IP Office
- Main IPC: H01S5/024
- IPC: H01S5/024 ; H01L23/48 ; H01L21/306 ; H01L27/02 ; H01L33/20 ; H01L33/62 ; H01L21/768 ; H01L23/00 ; H01S5/02 ; H01S5/026 ; H01S5/34 ; G02B6/12 ; G02B6/34 ; H01L29/861

Abstract:
A semiconductor laser structure is provided. The semiconductor laser comprises a central thermal shunt, a ring shaped silicon waveguide, a contiguous thermal shunt, an adhesive layer and a laser element. The central thermal shunt is located on a SOI substrate which has a buried oxide layer surrounding the central thermal shunt. The ring shaped silicon waveguide is located on the buried oxide layer and surrounds the central thermal shunt. The ring shaped silicon waveguide includes a P-N junction of a p-type material portion, an n-type material portion and a depletion region there between. The contiguous thermal shunt covers a portion of the buried oxide layer and surrounds the ring shaped silicon waveguide. The adhesive layer covers the ring shaped silicon waveguide and the buried oxide layer. The laser element covers the central thermal shunt, the adhesive layer and the contiguous thermal shunt.
Public/Granted literature
- US20150063386A1 SEMICONDUCTOR LASER STRUCTURE Public/Granted day:2015-03-05
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