Invention Grant
US09171973B2 Method for producing an integrated imaging device with front face illumination comprising at least one metal optical filter, and corresponding device
有权
用于制造具有前面照明的集成成像装置的方法，包括至少一个金属滤光器以及相应的装置
- Patent Title: Method for producing an integrated imaging device with front face illumination comprising at least one metal optical filter, and corresponding device
- Patent Title (中): 用于制造具有前面照明的集成成像装置的方法，包括至少一个金属滤光器以及相应的装置
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Application No.: US14559006Application Date: 2014-12-03
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Publication No.: US09171973B2Publication Date: 2015-10-27
- Inventor: Romain Girard Desprolet , Sandrine Lhostis , Salim Boutami , Michel Marty
- Applicant: STMicroelectronics (Crolles 2) SAS , STMicroelectronics SA , Commissariat a l'Energie Atomique et aux Energies Alternatives
- Applicant Address: FR Crolles FR Montrouge FR Paris
- Assignee: STMicroelectronics (Crolles 2) SAS,STMicroelectronics SA,Commissariat a l'Energie Atomique et aux Energies Alternatives
- Current Assignee: STMicroelectronics (Crolles 2) SAS,STMicroelectronics SA,Commissariat a l'Energie Atomique et aux Energies Alternatives
- Current Assignee Address: FR Crolles FR Montrouge FR Paris
- Agency: Gardere Wynne Sewell LLP
- Priority: FR1362088 20131204
- Main IPC: H01L31/0232
- IPC: H01L31/0232 ; H01L31/0216 ; G02B5/20 ; H01L27/146
Abstract:
An integrated imaging device supports front face illumination with one or more photosensitive regions formed in a substrate. A lower dielectric region is provided over the substrate, the lower dielectric region having an upper face. A metal optical filter having a metal pattern is provided on the upper face (or extending into the lower dielectric region from the upper face). An upper dielectric region is provided on top of the lower dielectric region and metal optical filter. The lower dielectric region is at least part of a pre-metal dielectric layer, and the upper dielectric region is at least part of a metallization layer.
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