发明授权
- 专利标题: Immersion tin silver plating in electronics manufacture
- 专利标题(中): 在电子制造中浸锡锡镀银
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申请号: US12607375申请日: 2009-10-28
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公开(公告)号: US09175400B2公开(公告)日: 2015-11-03
- 发明人: Yung-Herng Yau , Xingping Wang , Cai Wang , Robert Farrell , Pingping Ye , Edward J. Kudrak, Jr. , Karl F. Wengenroth , Joseph A. Abys
- 申请人: Yung-Herng Yau , Xingping Wang , Cai Wang , Robert Farrell , Pingping Ye , Edward J. Kudrak, Jr. , Karl F. Wengenroth , Joseph A. Abys
- 申请人地址: US CT West Haven
- 专利权人: Enthone Inc.
- 当前专利权人: Enthone Inc.
- 当前专利权人地址: US CT West Haven
- 代理机构: Senniger Powers LLP
- 主分类号: C23C18/54
- IPC分类号: C23C18/54 ; C23C18/48
摘要:
A method is provided for depositing a whisker resistant tin-based coating layer on a surface of a copper substrate. The method is useful for preparing an article comprising a copper substrate having a surface; and a tin-based coating layer on the surface of the substrate, wherein the tin-based coating layer has a thickness between 0.5 micrometers and 1.5 micrometers and has a resistance to formation of copper-tin intermetallics, wherein said resistance to formation of copper-tin intermetallics is characterized in that, upon exposure of the article to at least seven heating and cooling cycles in which each cycle comprises subjecting the article to a temperature of at least 217° C. followed by cooling to a temperature between about 20° C. and about 28° C., there remains a region of the tin coating layer that is free of copper that is at least 0.25 micrometers thick.
公开/授权文献
- US20110097597A1 IMMERSION TIN SILVER PLATING IN ELECTRONICS MANUFACTURE 公开/授权日:2011-04-28
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