Invention Grant
- Patent Title: Methods of forming nanostructures including metal oxides
- Patent Title (中): 形成纳米结构的方法,包括金属氧化物
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Application No.: US14040245Application Date: 2013-09-27
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Publication No.: US09177795B2Publication Date: 2015-11-03
- Inventor: Nicholas Hendricks , Adam L. Olson , William R. Brown , Ho Seop Eom , Xue Chen , Kaveri Jain , Scott Schuldenfrei
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: TraskBritt
- Main IPC: H01L21/302
- IPC: H01L21/302 ; H01L21/027 ; C08G81/00

Abstract:
A method of forming nanostructures may include forming a block copolymer composition within a trench in a material on a substrate, wherein the block copolymer composition may comprise a block copolymer material and an activatable catalyst having a higher affinity for a first block of the block copolymer material compared to a second block of the block copolymer material; self-assembling the block copolymer composition into first domains comprising the first block and the activatable catalyst, and second domains comprising the second block; generating catalyst from the activatable catalyst in at least one portion of the first domains to produce a structure comprising catalyst-containing domains and the second domains, the catalyst-containing domains comprising the first block and the catalyst; and reacting a metal oxide precursor with the catalyst in the catalyst-containing domains to produce a metal oxide-containing structure comprising the first block and metal oxide.
Public/Granted literature
- US20150091137A1 METHODS OF FORMING NANOSTRUCTURES INCLUDING METAL OXIDES AND SEMICONDUCTOR STRUCTURES INCLUDING SAME Public/Granted day:2015-04-02
Information query
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