Invention Grant
US09188851B2 Pattern mask and method of manufacturing thin film pattern using pattern mask
有权
图案掩模和使用图案掩模制造薄膜图案的方法
- Patent Title: Pattern mask and method of manufacturing thin film pattern using pattern mask
- Patent Title (中): 图案掩模和使用图案掩模制造薄膜图案的方法
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Application No.: US13829521Application Date: 2013-03-14
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Publication No.: US09188851B2Publication Date: 2015-11-17
- Inventor: Jun Hyuk Woo , Min Kang , Bong-Yeon Kim , Jeong Won Kim , Jin Ho Ju , Tae Gyun Kim , Chul Won Park , Hyun Joo Lee
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Yongin, Gyeonggi-Do
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR Yongin, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2012-0097861 20120904
- Main IPC: G03F9/00
- IPC: G03F9/00 ; G03F1/00
Abstract:
A pattern mask for patterning a thin film includes a transparent or translucent substrate with a plurality of grooves formed thereon having a pitch of about 4.6 μm to about 10.8 μm.
Public/Granted literature
- US20140065523A1 PATTERN MASK AND METHOD OF MANUFACTURING THIN FILM PATTERN USING PATTERN MASK Public/Granted day:2014-03-06
Information query
