Invention Grant
US09202571B2 Vertically-integrated nonvolatile memory devices having laterally-integrated ground select transistors 有权
具有横向集成的地选择晶体管的垂直集成的非易失性存储器件

Vertically-integrated nonvolatile memory devices having laterally-integrated ground select transistors
Abstract:
Nonvolatile memory devices utilize vertically-stacked strings of nonvolatile memory cells (e.g., NAND-type strings) that can be selectively coupled to common source lines within a substrate. This selective coupling may be provided by lateral ground select transistors having different threshold voltages that account for different lateral spacings between the vertically-stacked strings of nonvolatile memory cells and the common source lines.
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