发明授权
- 专利标题： Apparatus and method for detecting substrates
- 专利标题（中）： 用于检测基板的装置和方法
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申请号： US13121498申请日： 2009-09-29
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公开(公告)号： US09202732B2公开(公告)日： 2015-12-01
- 发明人: Masayuki Enomoto , Masao Takatori , Yohichi Nakamura
- 申请人： Masayuki Enomoto , Masao Takatori , Yohichi Nakamura
- 申请人地址： JP Kobe
- 专利权人： KAWASAKI JUKOGYO KABUSHIKI KAISHA
- 当前专利权人： KAWASAKI JUKOGYO KABUSHIKI KAISHA
- 当前专利权人地址： JP Kobe
- 代理机构： Oliff PLC
- 优先权： JP2008-256268 20081001
- 国际申请： PCT/JP2009/066938 WO 20090929
- 国际公布： WO2010/038735 WO 20100408
- 主分类号： H01L21/67
- IPC分类号： H01L21/67
摘要：
The substrate detection apparatus includes: a collimating reflector located on one side of substrates; an illumination unit configured to radiate light in a planar state toward the collimating reflector such that edge portions of the substrates are located in an optical path of the light; an image acquiring unit configured to acquire a passing light image including the edge portions formed on the collimating reflector with the light radiated in the planar state from the illumination unit; and an image processing unit configured to process the passing light image obtained by the image acquiring unit, thereby detecting the conditions of the substrates.
公开/授权文献
- US20110205354A1 APPARATUS AND METHOD FOR DETECTING SUBSTRATES 公开/授权日：2011-08-25
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