Invention Grant
- Patent Title: Nitride semiconductor light emitting device and method of manufacturing the same
- Patent Title (中): 氮化物半导体发光器件及其制造方法
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Application No.: US14534839Application Date: 2014-11-06
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Publication No.: US09202969B2Publication Date: 2015-12-01
- Inventor: Joo Young Cheon , Yu Ri Sohn
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-Si, Gyeonggi-Do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-Si, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2012-0023264 20120307
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L33/04 ; H01L33/00 ; H01L33/32

Abstract:
A method of manufacturing a nitride semiconductor light emitting device which includes forming an n-type semiconductor layer, forming an active layer on the n-type semiconductor layer, forming a superlattice layer by alternately stacking at least two nitride layers made of InxAlyGa(1-x-y)N (0≦x≦1, 0≦y≦1, and 0≦x+y≦1) having different energy bandgaps from each other and doped with a p-type dopant, and forming a p-type semiconductor layer on the superlattice layer. The forming of the superlattice layer is performed by adjusting a flow rate of a p-type dopant source gas to reduce the flow rate in a growth termination period of the superlattice layer by no greater than about half of the flow rate in a growth initiation period of the superlattice layer while being doped with the p-type dopant.
Public/Granted literature
- US20150060764A1 NITRIDE SEMICONDUCTOR LIGHT EMITTING DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2015-03-05
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