Invention Grant
- Patent Title: Circuit element including a layer of a stress-creating material providing a variable stress and method for the formation thereof
- Patent Title (中): 电路元件包括提供可变应力的应力产生材料层及其形成方法
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Application No.: US13768275Application Date: 2013-02-15
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Publication No.: US09209174B2Publication Date: 2015-12-08
- Inventor: Johannes von Kluge
- Applicant: GLOBALFOUNDRIES Inc.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee Address: KY Grand Cayman
- Agency: Amerson Law Firm, PLLC
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L29/66 ; H01L27/088 ; G05F3/02 ; H01L21/66 ; H03K19/20 ; H01L49/02 ; H01L29/8605 ; H03K19/017 ; H01L21/8238 ; H01L27/092

Abstract:
A transistor includes a source region, a drain region, a channel region, a gate electrode and a layer of a stress-creating material. The stress-creating material provides a stress that is variable in response to a signal acting on the stress-creating material. The layer of stress-creating material is arranged to provide a stress in at least the channel region. The stress provided in at least the channel region is variable in response to the signal acting on the stress-creating material. Layers of stress-creating material providing a stress that is variable in response to a signal acting on the stress-creating material may also be used in circuit elements other than transistors, for example, resistors.
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