发明授权
- 专利标题: Sintered compact of indium oxide system, and transparent conductive film of indium oxide system
- 专利标题(中): 氧化铟系烧结体,氧化铟系透明导电膜
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申请号: US13499712申请日: 2010-10-13
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公开(公告)号: US09214253B2公开(公告)日: 2015-12-15
- 发明人: Masakatsu Ikisawa , Hideo Takami
- 申请人: Masakatsu Ikisawa , Hideo Takami
- 申请人地址: JP Tokyo
- 专利权人: JX Nippon Mining & Metals Corporation
- 当前专利权人: JX Nippon Mining & Metals Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Howson & Howson LLP
- 优先权: JP2009-245293 20091026
- 国际申请: PCT/JP2010/067926 WO 20101013
- 国际公布: WO2011/052375 WO 20110505
- 主分类号: H01B1/08
- IPC分类号: H01B1/08 ; C03C17/245 ; C04B35/01 ; C04B35/626 ; C23C14/08 ; C23C14/34 ; C23C30/00
摘要:
A sintered indium oxide comprising niobium as an additive, wherein the ratio of the number of niobium atoms relative to the total number of atoms of all metal elements contained in the sintered compact is within a range of 1 to 4%, the relative density is 98% or higher, and the bulk resistance is 0.9 mΩ·cm or less. Provided are a sintered compact of indium oxide system and a transparent conductive film of indium oxide system, which have characteristics of high transmittance in the short wavelength and long wavelength ranges since the carrier concentration is not too high even though the resistivity thereof is low.
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