Invention Grant
US09214363B2 Coating and developing apparatus, coating film forming method, and storage medium storing program for performing the method
有权
涂覆和显影装置，涂膜形成方法和用于执行该方法的存储介质存储程序
- Patent Title: Coating and developing apparatus, coating film forming method, and storage medium storing program for performing the method
- Patent Title (中): 涂覆和显影装置，涂膜形成方法和用于执行该方法的存储介质存储程序
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Application No.: US13937833Application Date: 2013-07-09
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Publication No.: US09214363B2Publication Date: 2015-12-15
- Inventor: Hideharu Kyouda , Taro Yamamoto
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Minato-ku
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-031365 20060208
- Main IPC: B05C11/02
- IPC: B05C11/02 ; H01L21/67 ; G03F7/11 ; G03F7/16 ; G03F7/20
Abstract:
Disclosed is a technique for preventing a water-repellent protective film formed on a resist film from peeling off during immersion exposure. A resist film is formed on the front surface of a substrate and then the peripheral edge portion of the resist film is removed. Before forming a water-repellent protective film onto the resist film, an adhesion-improving fluid, preferably hexamethyldisilazane gas, for improving the adhesion of the water-repellent protective film, is supplied to the region from which the resist film is removed.
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