Invention Grant
US09214370B2 Substrate transfer device, substrate transfer method, and storage medium
有权
基板转印装置,基板转印方法和存储介质
- Patent Title: Substrate transfer device, substrate transfer method, and storage medium
- Patent Title (中): 基板转印装置,基板转印方法和存储介质
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Application No.: US13859822Application Date: 2013-04-10
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Publication No.: US09214370B2Publication Date: 2015-12-15
- Inventor: Naruaki Iida , Akihiro Teramoto
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Pearne & Gordon LLP
- Priority: JP2012-091111 20120412
- Main IPC: H01L21/677
- IPC: H01L21/677 ; H01L21/67

Abstract:
A substrate transfer device that transfers a substrate by allowing a substrate opening formed on a front surface of a substrate transfer vessel to face an opening formed on a partition wall from one side of the partition wall and separating a cover body of the substrate transfer vessel from the other side of the partition wall includes a door configured to open and close the opening from the other side of the partition wall; a reciprocating unit configured to straightly move the door back and forth between a first position where the opening is closed and a second position away from the first position toward the other side of the partition wall; and a rotating unit configured to rotate the door around a rotation axis in a straightly moving direction of the door between the second position and a third position deviated from a region facing the opening.
Public/Granted literature
- US20130272824A1 SUBSTRATE TRANSFER DEVICE, SUBSTRATE TRANSFER METHOD, AND STORAGE MEDIUM Public/Granted day:2013-10-17
Information query
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