发明授权
US09217196B2 Method for forming DLC film on spline shaft and hot cathode PIG plasma CVD device
有权
在花键轴和热阴极PIG等离子体CVD装置上形成DLC膜的方法
- 专利标题: Method for forming DLC film on spline shaft and hot cathode PIG plasma CVD device
- 专利标题(中): 在花键轴和热阴极PIG等离子体CVD装置上形成DLC膜的方法
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申请号: US13594133申请日: 2012-08-24
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公开(公告)号: US09217196B2公开(公告)日: 2015-12-22
- 发明人: Junji Ando , Tomoo Suzuki , Tomoki Ogawa , Akinori Iwai , Nobuyoshi Yoshimura , Hiroyuki Hashitomi
- 申请人: Junji Ando , Tomoo Suzuki , Tomoki Ogawa , Akinori Iwai , Nobuyoshi Yoshimura , Hiroyuki Hashitomi
- 申请人地址: JP Osaka-shi JP Kariya-shi
- 专利权人: JTEKT Corporation,CNK Co., Ltd.
- 当前专利权人: JTEKT Corporation,CNK Co., Ltd.
- 当前专利权人地址: JP Osaka-shi JP Kariya-shi
- 代理机构: Oblon, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2011-184372 20110826
- 主分类号: H05H1/24
- IPC分类号: H05H1/24 ; C23C14/06 ; C23C16/26 ; C23C16/458 ; C23C16/50 ; F16D3/06 ; F16C3/03 ; H01J37/32
摘要:
Plural spline shafts are arranged around columnar plasma, and plural spline shafts are coaxially aligned in a direction that the columnar plasma extends within a vacuum chamber. The plural coaxially aligned spline shafts are positioned so that axial gap is formed between the respective male spline sections. The axial gap of the plural male spline sections is positioned at a center of the columnar plasma in the direction that the columnar plasma extends.
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