发明授权
US09223217B2 Sulfonamide-containing topcoat and photoresist additive compositions and methods of use
有权
含磺酰胺的面漆和光致抗蚀剂添加剂组合物和使用方法
- 专利标题： Sulfonamide-containing topcoat and photoresist additive compositions and methods of use
- 专利标题（中）： 含磺酰胺的面漆和光致抗蚀剂添加剂组合物和使用方法
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申请号： US12709277申请日： 2010-02-19
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公开(公告)号： US09223217B2公开(公告)日： 2015-12-29
- 发明人: Daniel Paul Sanders , Masaki Fujiwara , Yoshiharu Terui
- 申请人： Daniel Paul Sanders , Masaki Fujiwara , Yoshiharu Terui
- 申请人地址： US NY Armonk JP Tokyo
- 专利权人： International Business Machines Corporation,Central Glass Co., Ltd.
- 当前专利权人： International Business Machines Corporation,Central Glass Co., Ltd.
- 当前专利权人地址： US NY Armonk JP Tokyo
- 代理机构： CanaanLaw, P.C.
- 代理商 Karen Canaan
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/11 ; G03F7/20 ; G03F7/038 ; G03F7/039
摘要：
Provided are sulfonamide-containing compositions, topcoat polymers, and additive polymers for use in lithographic processes that have improved static receding water contact angles over those known in the art. The sulfonamide-containing topcoat polymers and additive polymers of the present invention include sulfonamide-substituted repeat units with branched linking group as shown in Formula (I):
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