Invention Grant
- Patent Title: Mass flow controller system
- Patent Title (中): 质量流量控制器系统
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Application No.: US13519115Application Date: 2010-12-22
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Publication No.: US09223318B2Publication Date: 2015-12-29
- Inventor: Hiroyuki Takeuchi , Yutaka Yoneda , Yasuhiro Isobe
- Applicant: Hiroyuki Takeuchi , Yutaka Yoneda , Yasuhiro Isobe
- Applicant Address: JP Kyoto-shi
- Assignee: HORIBA STEC, Co., Ltd.
- Current Assignee: HORIBA STEC, Co., Ltd.
- Current Assignee Address: JP Kyoto-shi
- Agency: Alleman Hall McCoy Russell & Tuttle LLP
- Priority: JP2009-295400 20091225
- International Application: PCT/JP2010/073172 WO 20101222
- International Announcement: WO2011/078242 WO 20110630
- Main IPC: G05D7/06
- IPC: G05D7/06

Abstract:
A mass flow controller with high accuracy flow rate output control is disclosed. In the mass flow controller, relation data that indicates a corresponding relation between a flow rate of a reference gas and a CF value of a sample gas is stored, a target flow rate is converted into a reference gas flow rate by the use of a predetermined CF value, a sample gas flow rate is calculated from the converted reference gas flow rate and a CF value corresponding to the reference gas flow rate, the sample gas flow rate is compared with the target flow rate, and the CF value that is used for conversion of the reference gas flow rate or calculation of the sample gas flow rate is updated by the use of the corresponding relation based on the error between the sample gas flow rate and the target flow rate.
Public/Granted literature
- US20120298221A1 MASS FLOW CONTROLLER SYSTEM Public/Granted day:2012-11-29
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