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公开(公告)号：US20240324464A1
公开(公告)日：2024-09-26
申请号：US18597775
申请日：2024-03-06
发明人： Akihiro TAGUCHI , Chihiro HAMADA
CPC分类号： H10N30/802 , G01N29/222
摘要： The present invention enables a piezo element to be replaced or maintained at an appropriate timing, and is a piezo element diagnosis device for making a diagnosis of a piezo element incorporated in a piece of equipment, and includes a driving information acquisition unit that acquires driving information of the piezo element, and a life calculation unit that calculates a consumed life or a remaining life of the piezo element based on the driving information.
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2.发明公开公开(公告)号：US20240201157A1
公开(公告)日：2024-06-20
申请号：US18288097
申请日：2022-02-14
发明人： Motonobu TAKAHASHI
CPC分类号： G01N33/0067 , G01N1/02 , G01N33/18 , G01N2001/028 , G01N2033/0068
摘要： A gas analysis device for analyzing a compound gas and H2O gas produced in a main reaction in which an aqueous solution including a compound and water is vaporized, includes a first concentration calculating unit that calculates a concentration of the compound gas, a second concentration calculating unit that calculates a concentration of the H2O gas, an analysis unit that compares a first actual concentration which is the concentration of the compound gas calculated by the first concentration calculating unit with a first ideal concentration which is the concentration of the compound gas in case that the main reaction proceeds ideally, and that compares a second actual concentration which is the concentration of the H2O gas calculated by the second concentration calculating unit with a second ideal concentration which is the concentration of the H2O gas in case that the main reaction proceeds ideally and an output unit.
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公开(公告)号：US20240060573A1
公开(公告)日：2024-02-22
申请号：US18366925
申请日：2023-08-08
发明人： Kazuya SHAKUDO , Yuki HIDA , Shigeyuki HAYASHI
CPC分类号： F16K31/0655 , F16K1/36 , F16K27/029 , F16K31/0675 , F16K37/0066
摘要： The present invention enables fluid control with a smaller current or voltage by reducing a magnetic resistance of a magnetic path including the valve body. The present invention includes: a flow path block formed with an internal flow path; an orifice fixed to the flow path block and having a valve seat surface; a valve body having a seating surface seated on the valve seat surface, and made of a magnetic material; and an actuator portion that drives the valve body by a magnetic force. The actuator portion includes: an iron core provided to face a surface of the valve body opposite to the seating surface; a solenoid coil wound around the iron core; and a casing accommodating the iron core and the solenoid coil, and made of a magnetic material. The casing extends to a position surrounding a periphery of the valve body.
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公开(公告)号：US11899475B2
公开(公告)日：2024-02-13
申请号：US17447320
申请日：2021-09-10
发明人： Kazuya Imai
IPC分类号： G05D7/06 , F16K31/02 , F16K41/10 , F16K1/36 , F16K31/12 , F16K1/00 , F16K1/52 , F16K27/02 , F16K1/42 , F16K25/00
CPC分类号： G05D7/0635 , F16K31/02 , F16K1/00 , F16K1/36 , F16K1/42 , F16K1/52 , F16K25/005 , F16K27/02 , F16K31/12 , F16K41/10 , G05D7/06
摘要： In order to achieve an enlargement of a seating surface, and to additionally achieve an improvement in productivity while forming this seating surface using a resin layer, without having to sacrifice any of the drive range of the valve body, there is provided a fluid control valve that is formed such that drive force from an actuator is transmitted to a valve body via a plunger, and that controls a flow of a fluid by causing a seating surface of the valve body to move towards or away from a valve seat surface of a valve seat, wherein the valve body is a separate body from the plunger, and the seating surface is formed by a resin layer.
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公开(公告)号：US20240030013A1
公开(公告)日：2024-01-25
申请号：US18222029
申请日：2023-07-14
发明人： Miyako HADA , Motonobu TAKAHASHI , Masakazu MINAMI , Yuhei SAKAGUCHI , Toru SHIMIZU , Tetsuo FUJII
CPC分类号： H01J37/32981 , H01J37/32926 , H01L21/67069 , H01L21/67253 , H01J2237/2445 , H01J2237/3341
摘要： The present invention is aimed to perform precise monitoring of the processed amount by which a workpiece is processed, and includes a measurement unit that measures a concentration or a partial pressure of a reaction product generated while the workpiece is being processed, and an operation unit that calculates the processed amount of the workpiece using an output value of the measurement unit. The measurement unit includes: a laser light source that irradiates target gas containing the reaction product with a laser beam; a photodetector that detects a laser beam having passed through the target gas; and a signal processing unit that calculates the concentration or the partial pressure of the reaction product based on a detection signal of the photodetector. The operation unit includes a time integration unit; a relationship data storage unit; and a processed amount calculation unit.
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公开(公告)号：US20230417660A1
公开(公告)日：2023-12-28
申请号：US18039316
申请日：2021-11-22
IPC分类号： G01N21/3504 , G01N21/03 , G01N21/39
CPC分类号： G01N21/3504 , G01N21/0332 , G01N21/39 , G01N2201/127
摘要： The present invention is a gas analysis device that measures a concentration or partial pressure of a halide contained in a material gas used in semiconductor manufacturing process or a by-product gas generated in semiconductor manufacturing process with good accuracy, the device being for analyzing a concentration or partial pressure of a halide contained in a material gas used in a semiconductor manufacturing process or a by-product gas generated in a semiconductor manufacturing process, the device including a gas cell into which the material gas or the by-product gas is introduced, a laser light source that irradiates the gas cell with laser light whose wavelength is modulated, a light detector that detects the laser light transmitted through the gas cell, and a signal processing unit that calculates the concentration or partial pressure of the halide by using a light absorption signal obtained from an output signal of the light detector.
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7.发明公开公开(公告)号：US20230168697A1
公开(公告)日：2023-06-01
申请号：US18051637
申请日：2022-11-01
发明人： Kazuya TOKUNAGA
IPC分类号： G05D7/06
CPC分类号： G05D7/0647
摘要： Provided is a flow rate controller. The flow rate controller calculates a resistor flow rate that is a flow rate of a fluid flowing through a fluid resistor, on the basis of a first measured pressure measured by a first pressure sensor and a second measured pressure measured by a second pressure sensor; controls a second valve on the basis of a deviation of the resistor flow rate from the set flow rate; outputs a first set pressure that is a target of a pressure upstream of the fluid resistor, on the basis of the set flow rate and a second set pressure which is a target of a pressure downstream of the fluid resistor and to which a constant value is set; and controls the first valve on the basis of a deviation of the first measured pressure from the first set pressure.
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公开(公告)号：US11644852B2
公开(公告)日：2023-05-09
申请号：US17316940
申请日：2021-05-11
发明人： Yusuke Kanamaru , Kotaro Takijiri , Kazuya Shakudo
CPC分类号： G05D11/132 , F16K37/005 , G01F15/06 , G05D7/0652 , G05D7/0664 , H01L21/67253 , C23C16/45561 , C23C16/52 , G05D7/0635
摘要： A system that controls the flow rates of a plurality of split channels provided parallel to each other to a certain flow split ratio includes: a flow split ratio calculation unit that, in order to be able to diagnose whether a system abnormality that affects the flow split ratio is occurring, calculates a ratio of output values of flow rate sensors obtained by allowing, while fluid control valves of different split channels are closed, fluids to flow in these split channels as an actual flow split ratio; a reference flow split ratio storage unit that stores a reference flow split ratio serving as a reference for the actual flow split ratio; and an abnormality diagnosis unit that compares the actual flow split ratio and the reference flow split ratio, and diagnoses a system abnormality.
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公开(公告)号：US20220413521A1
公开(公告)日：2022-12-29
申请号：US17847822
申请日：2022-06-23
摘要： In order to prevent unnatural behavior of a calculated flow rate, provided is a fluid control device in which a fluid control valve and upstream and downstream pressure sensors are provided on a flow path. The device includes a calculation unit configured to calculate a flow rate based on measured pressures; and an output unit configured to output the calculated flow rate, and exhibit a zero output function of outputting a zero value regardless of the calculated flow rate when the valve is in a closed state. The device is further configured to switch between execution and stop of the zero output function, and when the valve is in an open state and a difference between the measured pressures of the pressure sensors is larger than a threshold, stop the zero output function and cause the flow rate output unit to output the calculated flow rate.
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公开(公告)号：US20220276664A1
公开(公告)日：2022-09-01
申请号：US17637900
申请日：2020-07-03
发明人： Andrew PRICE
IPC分类号： G05D7/06
摘要： To provide a flow rate control valve that can improve responsiveness of flow rate control of a pressure differential type of a flow rate control device. The flow rate control valve is so configured to comprise a pair of valve members each of which has a seat surface being in contact with each other, to provide an internal flow channel that opens toward the seat surfaces and that passes through the inside of at least one of the valve members, and to control a flow rate of a fluid flowing out through the internal flow channel to the outside by adjusting a separation distance between the seat surfaces. And a restricted flow channel is formed in the internal flow channel so that a differential pressure is generated between an upstream side and a downstream side of the restricted flow channel.
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