Invention Grant
US09231091B2 Semiconductor device and reverse conducting insulated gate bipolar transistor with isolated source zones
有权
具有隔离源极区的半导体器件和反向导通绝缘栅双极晶体管
- Patent Title: Semiconductor device and reverse conducting insulated gate bipolar transistor with isolated source zones
- Patent Title (中): 具有隔离源极区的半导体器件和反向导通绝缘栅双极晶体管
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Application No.: US14275193Application Date: 2014-05-12
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Publication No.: US09231091B2Publication Date: 2016-01-05
- Inventor: Roman Baburske , Matteo Dainese , Peter Lechner , Hans-Joachim Schulze , Johannes Georg Laven
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Murphy, Bilak & Homiller, PLLC
- Main IPC: H01L29/739
- IPC: H01L29/739 ; H01L29/861 ; H01L29/66

Abstract:
A semiconductor device includes a semiconductor mesa with at least one body zone forming first pn junctions with source zones and a second pn junction with a drift zone. A pedestal layer at a side of the drift zone opposite to the at least one body zone includes first zones of a conductivity type of the at least one body zone and second zones of the conductivity type of the drift zone. Electrode structures are on opposite sides of the semiconductor mesa. At least one of the electrode structures includes a gate electrode controlling a charge carrier flow through the at least one body zone. In a separation region between two of the source zones (i) a capacitive coupling between the gate electrode and the semiconductor mesa or (ii) a conductivity of majority charge carriers of the drift zone is lower than outside of the separation region.
Public/Granted literature
- US20150325688A1 SEMICONDUCTOR DEVICE AND REVERSE CONDUCTING INSULATED GATE BIPOLAR TRANSISTOR WITH ISOLATED SOURCE ZONES Public/Granted day:2015-11-12
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