- Patent Title: Target for laser produced plasma extreme ultraviolet light source
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Application No.: US14817408Application Date: 2015-08-04
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Publication No.: US09232624B2Publication Date: 2016-01-05
- Inventor: Robert J. Rafac , Yezheng Tao
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: DiBerardino McGovern IP Group LLC
- Main IPC: H05G2/00
- IPC: H05G2/00 ; G03F7/20

Abstract:
Techniques for generating EUV light include directing a first pulse of radiation toward a target material droplet to form a modified droplet, the first pulse of radiation having an energy sufficient to alter a shape of the target material droplet; directing a second pulse of radiation toward the modified droplet to form an absorption material, the second pulse of radiation having an energy sufficient to change a property of the modified droplet, the property being related to absorption of radiation; and directing an amplified light beam toward the absorption material, the amplified light beam having an energy sufficient to convert at least a portion of the absorption material into extreme ultraviolet (EUV) light.
Public/Granted literature
- US20150342016A1 TARGET FOR LASER PRODUCED PLASMA EXTREME ULTRAVIOLET LIGHT SOURCE Public/Granted day:2015-11-26
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