Invention Grant
US09233834B2 MEMS device having a suspended diaphragm and manufacturing process thereof
有权
具有悬挂隔膜的MEMS装置及其制造方法
- Patent Title: MEMS device having a suspended diaphragm and manufacturing process thereof
- Patent Title (中): 具有悬挂隔膜的MEMS装置及其制造方法
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Application No.: US14316504Application Date: 2014-06-26
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Publication No.: US09233834B2Publication Date: 2016-01-12
- Inventor: Dino Faralli , Paolo Ferrari , Laura Maria Castoldi
- Applicant: STMicroelectronics S.r.I.
- Applicant Address: IT Agrate Brianza
- Assignee: STMicroelectronics S.r.l.
- Current Assignee: STMicroelectronics S.r.l.
- Current Assignee Address: IT Agrate Brianza
- Agency: Seed IP Law Group PLLC
- Priority: ITTO2013A0540 20130628
- Main IPC: B81B3/00
- IPC: B81B3/00 ; B81B7/00 ; B81C1/00 ; B81C3/00

Abstract:
A MEMS device wherein a die of semiconductor material has a first face and a second face. A diaphragm is formed in or on the die and faces the first surface. A cap is fixed to the first face of the die and has a hole forming a fluidic path connecting the diaphragm with the outside world. A closing region, for example a support, a second cap, or another die, is fixed to the second face of the die. The closing region forms, together with the die and the cap, a stop structure configured to limit movements of the suspended region in a direction perpendicular to the first face.
Public/Granted literature
- US20150001651A1 MEMS DEVICE HAVING A SUSPENDED DIAPHRAGM AND MANUFACTURING PROCESS THEREOF Public/Granted day:2015-01-01
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