发明授权
- 专利标题： Material forming supramolecular structures, process and uses
- 专利标题（中）： 材料形成超分子结构，工艺和用途
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申请号： US11603733申请日： 2006-11-22
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公开(公告)号： US09234067B2公开(公告)日： 2016-01-12
- 发明人: Wayne Hayes , Philip James Woodward , Alex Clarke , Andrew Trevithick Slark
- 申请人： Wayne Hayes , Philip James Woodward , Alex Clarke , Andrew Trevithick Slark
- 申请人地址： DE Duesseldorf
- 专利权人： Henkel AG & Co. KGaA
- 当前专利权人： Henkel AG & Co. KGaA
- 当前专利权人地址： DE Duesseldorf
- 代理商 James E. Piotrowski
- 优先权： EP05026211 20051201
- 主分类号： C08G18/00
- IPC分类号： C08G18/00 ; C08G18/32 ; C09J175/02 ; C08G18/10 ; C08G18/28
摘要：
A novel material, forming supramolecular structures below its transition temperature, which contains at least one C═O and/or C═S group and at least one N—H, O—H and/or S—H group and wherein the material has the structure A(-X—B)n (1) wherein A, X, B and n are defined. Also a process for preparation of the material and uses thereof.
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