Invention Grant
- Patent Title: Light emission detection device having a flow path formed by a depression of a detection side substrate and method of manufacturing the same
- Patent Title (中): 具有由检测侧基板的凹陷形成的流路的发光检测装置及其制造方法
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Application No.: US13983754Application Date: 2012-01-25
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Publication No.: US09234791B2Publication Date: 2016-01-12
- Inventor: Makoto Ogusu
- Applicant: Makoto Ogusu
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon USA, Inc. IP Division
- Priority: JP2011-024018 20110207
- International Application: PCT/JP2012/052197 WO 20120125
- International Announcement: WO2012/108303 WO 20120816
- Main IPC: H01J5/02
- IPC: H01J5/02 ; G01J1/42 ; B01L3/00 ; G01N21/03 ; G01N21/05 ; G01N21/64 ; B29D11/00

Abstract:
A light emission detection device having a flow path from which light to be detected is emitted is provided. The device includes a detection-side substrate having a joining surface and a detection surface provided opposite the joining surface, the joining surface having a depression and a light-shielding film provided over an area excluding the depression, the depression forming the flow path, the detection surface transmitting the light emitted from the flow path; and a wiring-side substrate having a joining surface and a conductive pattern provided with a varying thickness on the joining surface, the joining surface of the wiring-side substrate joining the joining surface of the detection-side substrate. In the area over which the light-shielding film is provided, adhesive is provided with a thickness corresponding to the varying thickness of the conductive pattern and the detection-side substrate and the wiring-side substrate are closely joined to each other with the adhesive.
Public/Granted literature
- US20130313417A1 LIGHT EMISSION DETECTION DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2013-11-28
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