发明授权
- 专利标题： Run-to-run control utilizing virtual metrology in semiconductor manufacturing
- 专利标题（中）： 半导体制造中利用虚拟计量的运行控制
-
申请号： US13557955申请日： 2012-07-25
-
公开(公告)号： US09240360B2公开(公告)日： 2016-01-19
- 发明人: Robert Jeffrey Baseman , Jingrui He , Emmanuel Yashchin , Yada Zhu
- 申请人： Robert Jeffrey Baseman , Jingrui He , Emmanuel Yashchin , Yada Zhu
- 申请人地址： US NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： US NY Armonk
- 代理机构： Otterstedt, Ellenbogen & Kammer, LLP
- 代理商 Daniel P. Morris, Esq.
- 主分类号： G06F19/00
- IPC分类号： G06F19/00 ; H01L21/66 ; G05B13/04 ; G05B19/418
摘要：
A method for run-to-run control and sampling optimization in a semiconductor manufacturing process includes the steps of: determining a process output and corresponding metrology error associated with an actual metrology for a current processing run in the semiconductor manufacturing process; determining a predicted process output and corresponding prediction error associated with a virtual metrology for the current processing run; and controlling at least one parameter corresponding to a subsequent processing run as a function of the metrology error and the prediction error.