发明授权
- 专利标题： Non-ionic photo-acid generating polymers for resist applications
- 专利标题（中）： 用于抗蚀剂应用的非离子光酸产生聚合物
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申请号： US14534824申请日： 2014-11-06
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公开(公告)号： US09244345B1公开(公告)日： 2016-01-26
- 发明人: Takehisa Ishimaru , Satoru Narizuka , Daniel P. Sanders , Ratnam Sooriyakumaran , Hoa D. Truong , Rudy J. Wojtecki , Manabu Yasumoto
- 申请人： International Business Machines Corporation , Central Glass Co., Ltd.
- 申请人地址： US NY Armonk JP Ube-Shi, Yamaguchi
- 专利权人： International Business Machines Corporation,Central Glass Co., LTD.
- 当前专利权人： International Business Machines Corporation,Central Glass Co., LTD.
- 当前专利权人地址： US NY Armonk JP Ube-Shi, Yamaguchi
- 代理商 Michael R. Roberts
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/039 ; G03F7/30 ; G03F7/20 ; G03F7/32 ; C07D221/14 ; C08F220/52 ; C08F220/70 ; G03F7/38 ; C07C309/65 ; C07C309/73 ; C08F226/06
摘要：
Photo-acid generating vinyl polymerizable monomers (PAG monomers) were prepared comprising sulfonate ester groups of N-hydroxide imides. The photo-acid generating portion of the PAG monomer is linked to a polymerizable portion of the monomer by an amide linking group. Photo-acid generating polymers (PAG polymers) of the PAG monomers show high sensitivity to extreme ultraviolet radiation (13.5 nm) and much less sensitivity to far ultraviolet wavelengths (193 nm, 248 nm). The PAG polymers also exhibit thermal and chemical amplification properties useful for forming high resolution positive tone or negative tone lithographic resist patterns.
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