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公开(公告)号：US10957953B2
公开(公告)日：2021-03-23
申请号：US15486957
申请日：2017-04-13
IPC分类号： H01M12/08 , H01M4/38 , H01M10/0569
摘要： A battery employing lithium-oxygen chemistry may include an anode comprising lithium, an electrolyte, and a porous cathode. The electrolyte may include a lithium-containing salt; a partially fluorinated ether, such as 2,2-bis(trifluoromethyl)-1,3-dioxolane; and a co-solvent selected from the group consisting of ethers, amides, nitriles, and combinations thereof. In some examples, the electrolyte does not include a cyclic carbonate ester, a sulfolane, or a sulfolane derivative. The porous cathode allows oxygen to come into contact with the electrolyte.
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公开(公告)号：US20180044284A1
公开(公告)日：2018-02-15
申请号：US15235342
申请日：2016-08-12
发明人： Takehisa Ishimaru , Satoru Narizuka , Daniel P. Sanders , Ratnam Sooriyakumaran , Hoa D. Truong , Rudy J. Wojtecki
CPC分类号： C07C309/69 , C07C309/70 , C07C2603/74 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/168 , G03F7/2004 , G03F7/322 , G03F7/38
摘要： Non-ionic photo-acid generating (PAG) compounds were prepared that contain an aryl ketone group. The disclosed non-polymeric PAGs release a strong sulfonic acid when exposed to high energy radiation such as deep UV or extreme UV light. The photo-generated sulfonic acid has a low diffusion rate in an exposed resist layer subjected to a post-exposure bake (PEB) at 100° C. to 150° C., resulting in formation of good line patterns after development. At higher temperatures, the PAGs undergo a thermal reaction to form a sulfonic acid.
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公开(公告)号：US20170222290A1
公开(公告)日：2017-08-03
申请号：US15486957
申请日：2017-04-13
IPC分类号： H01M12/08 , H01M4/38 , H01M10/0569
CPC分类号： H01M12/08 , H01M4/382 , H01M10/0569 , H01M2220/20 , H01M2300/0028 , H01M2300/0034 , H01M2300/0037 , Y02E60/128
摘要： A battery employing lithium-oxygen chemistry may include an anode comprising lithium, an electrolyte, and a porous cathode. The electrolyte may include a lithium-containing salt; a partially fluorinated ether, such as 2,2-bis(trifluoromethyl)-1,3-dioxolane; and a co-solvent selected from the group consisting of ethers, amides, nitriles, and combinations thereof. In some examples, the electrolyte does not include a cyclic carbonate ester, a sulfolane, or a sulfolane derivative. The porous cathode allows oxygen to come into contact with the electrolyte.
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公开(公告)号：US20180046077A1
公开(公告)日：2018-02-15
申请号：US15235410
申请日：2016-08-12
发明人： Takehisa Ishimaru , Satoru Narizuka , Daniel P. Sanders , Ratnam Sooriyakumaran , Hoa D. Truong , Rudy J. Wojtecki
IPC分类号： G03F7/004 , G03F7/038 , G03F7/16 , G03F7/20 , C07C309/76 , G03F7/38 , C07C309/69 , C07C309/68 , C07C309/70 , C07F7/21 , G03F7/039 , G03F7/32
CPC分类号： G03F7/0045 , C07C309/68 , C07C309/70 , C07C309/77 , C07C317/04 , C07C317/06 , C07C317/08 , C07C317/10 , C07C317/14 , C07C317/24 , C07C317/26 , C07C317/32 , C07C2103/74 , C07C2603/74 , C07F7/21 , G03F7/0046 , G03F7/0397 , G03F7/0755 , G03F7/322 , G03F7/325 , G03F7/38
摘要： Non-ionic photo-acid generating (PAG) compounds were prepared that contain an aryl ketone group having a perfluorinated substituent alpha to the ketone carbonyl. The non-polymeric PAGs release a sulfonic acid when exposed to high energy radiation such as deep UV or extreme UV light. The photo-generated sulfonic acid has a low diffusion rate in an exposed resist layer subjected to a post-exposure bake (PEB) at 100° C. to 150° C., resulting in formation of good line patterns after development. At higher temperatures, the PAGs can also undergo a thermal reaction to form a sulfonic acid. The perfluorinated substituent provides improved thermal stability and hydrolytic/nucleophilic stability.
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公开(公告)号：US09951164B2
公开(公告)日：2018-04-24
申请号：US15235673
申请日：2016-08-12
发明人： Takehisa Ishimaru , Satoru Narizuka , Daniel P. Sanders , Ratnam Sooriyakumaran , Hoa D. Truong , Rudy J. Wojtecki
IPC分类号： G03F7/004 , G03F7/38 , C07C317/04 , C07C317/06 , C07C317/08 , C07C317/10 , C07C317/14 , C07C317/24 , C07C317/26 , C07C317/32 , C08F212/04 , C08F212/32 , C08F220/24 , C08F220/38 , C07C309/69 , C07C309/70 , C08F220/68 , G03F7/039 , G03F7/038 , G03F7/20 , G03F7/32 , C07C309/68 , C07C309/77
CPC分类号： C07C309/69 , C07C309/68 , C07C309/70 , C07C309/77 , C08F220/28 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： Non-ionic photo-acid generating (PAG) polymerizable monomers were prepared that contain a side chain sulfonate ester of an alpha-hydroxy aryl ketone. The aryl ketone group has a perfluorinated substituent alpha to the ketone carbonyl. The sulfur of the sulfonate ester is also directly linked to a fluorinated group. PAG polymers prepared from the PAG monomers release a strong sulfonic acid when exposed to high energy radiation such as deep UV or extreme UV light. The photo-generated sulfonic acid has a low diffusion rate in an exposed resist layer subjected to a post-exposure bake (PEB) at 100° C. to 150° C., resulting in formation of good line patterns after development.
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公开(公告)号：US09244345B1
公开(公告)日：2016-01-26
申请号：US14534824
申请日：2014-11-06
发明人： Takehisa Ishimaru , Satoru Narizuka , Daniel P. Sanders , Ratnam Sooriyakumaran , Hoa D. Truong , Rudy J. Wojtecki , Manabu Yasumoto
IPC分类号： G03F7/004 , G03F7/039 , G03F7/30 , G03F7/20 , G03F7/32 , C07D221/14 , C08F220/52 , C08F220/70 , G03F7/38 , C07C309/65 , C07C309/73 , C08F226/06
CPC分类号： G03F7/0045 , C07C309/65 , C07C309/73 , C07D221/14 , C08F220/36 , C08F220/52 , C08F220/70 , C08F226/02 , C08F226/06 , C08F2220/283 , G03F7/0046 , G03F7/0397 , G03F7/2041 , G03F7/30 , G03F7/322 , G03F7/325 , G03F7/38
摘要： Photo-acid generating vinyl polymerizable monomers (PAG monomers) were prepared comprising sulfonate ester groups of N-hydroxide imides. The photo-acid generating portion of the PAG monomer is linked to a polymerizable portion of the monomer by an amide linking group. Photo-acid generating polymers (PAG polymers) of the PAG monomers show high sensitivity to extreme ultraviolet radiation (13.5 nm) and much less sensitivity to far ultraviolet wavelengths (193 nm, 248 nm). The PAG polymers also exhibit thermal and chemical amplification properties useful for forming high resolution positive tone or negative tone lithographic resist patterns.
摘要翻译： 制备包含N-氢化亚胺的磺酸酯基的光产酸乙烯基聚合单体（PAG单体）。 PAG单体的光酸产生部分通过酰胺连接基与单体的可聚合部分连接。 PAG单体的光产酸聚合物（PAG聚合物）显示出对极紫外辐射（13.5nm）的高灵敏度，对远紫外线波长（193nm，248nm）的敏感性低得多。 PAG聚合物还具有用于形成高分辨率正色调或负色调光刻抗蚀剂图案的热和化学扩增性质。
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公开(公告)号：US09983475B2
公开(公告)日：2018-05-29
申请号：US15235410
申请日：2016-08-12
发明人： Takehisa Ishimaru , Satoru Narizuka , Daniel P. Sanders , Ratnam Sooriyakumaran , Hoa D. Truong , Rudy J. Wojtecki
IPC分类号： G03F7/004 , G03F7/38 , G03F7/039 , G03F7/038 , G03F7/16 , G03F7/20 , G03F7/32 , C07C309/69 , C07C309/68 , C07C309/70 , C07F7/21 , C07C309/76 , C07C317/14 , C07C317/10 , C07C317/04 , C07C317/06 , C07C317/08 , C07C317/32 , C07C317/24 , C07C317/26
CPC分类号： G03F7/0045 , C07C309/68 , C07C309/70 , C07C309/77 , C07C317/04 , C07C317/06 , C07C317/08 , C07C317/10 , C07C317/14 , C07C317/24 , C07C317/26 , C07C317/32 , C07C2103/74 , C07C2603/74 , C07F7/21 , G03F7/0046 , G03F7/0397 , G03F7/0755 , G03F7/322 , G03F7/325 , G03F7/38
摘要： Non-ionic photo-acid generating (PAG) compounds were prepared that contain an aryl ketone group having a perfluorinated substituent alpha to the ketone carbonyl. The non-polymeric PAGs release a sulfonic acid when exposed to high energy radiation such as deep UV or extreme UV light. The photo-generated sulfonic acid has a low diffusion rate in an exposed resist layer subjected to a post-exposure bake (PEB) at 100° C. to 150° C., resulting in formation of good line patterns after development. At higher temperatures, the PAGs can also undergo a thermal reaction to form a sulfonic acid. The perfluorinated substituent provides improved thermal stability and hydrolytic/nucleophilic stability.
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公开(公告)号：US09950999B2
公开(公告)日：2018-04-24
申请号：US15235342
申请日：2016-08-12
发明人： Takehisa Ishimaru , Satoru Narizuka , Daniel P. Sanders , Ratnam Sooriyakumaran , Hoa D. Truong , Rudy J. Wojtecki
IPC分类号： G03F7/004 , G03F7/38 , C07C317/04 , C07C317/06 , C07C317/08 , C07C317/10 , C07C317/14 , C07C317/24 , C07C317/26 , C07C317/32 , C07C309/69 , G03F7/039 , G03F7/038 , G03F7/16 , G03F7/20 , G03F7/32
CPC分类号： C07C309/69 , C07C309/70 , C07C2603/74 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/168 , G03F7/2004 , G03F7/322 , G03F7/38
摘要： Non-ionic photo-acid generating (PAG) compounds were prepared that contain an aryl ketone group. The disclosed non-polymeric PAGs release a strong sulfonic acid when exposed to high energy radiation such as deep UV or extreme UV light. The photo-generated sulfonic acid has a low diffusion rate in an exposed resist layer subjected to a post-exposure bake (PEB) at 100° C. to 150° C., resulting in formation of good line patterns after development. At higher temperatures, the PAGs undergo a thermal reaction to form a sulfonic acid.
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公开(公告)号：US20180044459A1
公开(公告)日：2018-02-15
申请号：US15235673
申请日：2016-08-12
发明人： Takehisa Ishimaru , Satoru Narizuka , Daniel P. Sanders , Ratnam Sooriyakumaran , Hoa D. Truong , Rudy J. Wojtecki
IPC分类号： C08F220/68 , G03F7/039 , G03F7/038 , C07C309/70 , G03F7/38 , G03F7/32 , C07C309/68 , C07C309/77 , G03F7/004 , G03F7/20
CPC分类号： C07C309/69 , C07C309/68 , C07C309/70 , C07C309/77 , C08F220/28 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： Non-ionic photo-acid generating (PAG) polymerizable monomers were prepared that contain a side chain sulfonate ester of an alpha-hydroxy aryl ketone. The aryl ketone group has a perfluorinated substituent alpha to the ketone carbonyl. The sulfur of the sulfonate ester is also directly linked to a fluorinated group. PAG polymers prepared from the PAG monomers release a strong sulfonic acid when exposed to high energy radiation such as deep UV or extreme UV light. The photo-generated sulfonic acid has a low diffusion rate in an exposed resist layer subjected to a post-exposure bake (PEB) at 100° C. to 150° C., resulting in formation of good line patterns after development.
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公开(公告)号：US09666918B2
公开(公告)日：2017-05-30
申请号：US14228653
申请日：2014-03-28
CPC分类号： H01M12/08 , H01M4/382 , H01M10/0569 , H01M2220/20 , H01M2300/0028 , H01M2300/0034 , H01M2300/0037 , Y02E60/128
摘要： A battery employing lithium-oxygen chemistry may include an anode comprising lithium, an electrolyte, and a porous cathode. The electrolyte may include a lithium-containing salt; a partially fluorinated ether, such as 2,2-bis(trifluoromethyl)-1,3-dioxolane; and a co-solvent selected from the group consisting of ethers, amides, nitriles, and combinations thereof. In some examples, the electrolyte does not include a cyclic carbonate ester, a sulfolane, or a sulfolane derivative. The porous cathode allows oxygen to come into contact with the electrolyte.
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