Invention Grant
- Patent Title: Charged particle beam apparatus and image forming method
- Patent Title (中): 带电粒子束装置和成像方法
-
Application No.: US14613538Application Date: 2015-02-04
-
Publication No.: US09245711B2Publication Date: 2016-01-26
- Inventor: Michio Hatano , Yusuke Abe , Zhigang Wang
- Applicant: Hitachi High-Technologies Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP2014-019133 20140204
- Main IPC: G01N15/14
- IPC: G01N15/14 ; H01J37/28 ; H01J37/22

Abstract:
In observation of a sample having a structure in its depth direction, a charged particle beam apparatus that can form an SEM image reflecting a sample shape at a desired depth by a single image acquisition while avoiding enlargement of the apparatus is provided. The apparatus has: an irradiation optical system for irradiating and scanning a charged particle beam generated from a charged particle source on the sample; a detection optical system having a detector that detects charged particles generated from the sample by the irradiation of the charged particle beam, and converts them into an electric signal at a predetermined sampling period; and an image processing unit for forming an image based on the electric signal from the detector, in which the image processing unit detects a peak of wave height values for each pixel from the electric signal at each sampling time, and forms the image based on the peak of the detected wave height values.
Public/Granted literature
- US20150221471A1 Charged Particle Beam Apparatus and Image Forming Method Public/Granted day:2015-08-06
Information query