公开(公告)号：US11353798B2

公开(公告)日：2022-06-07

申请号：US16645885

申请日：2017-10-13

Applicant: Hitachi High-Technologies Corporation

Inventor： Takuma Yamamoto ,  Hiroya Ohta ,  Kenji Tanimoto ,  Yusuke Abe ,  Tomohiro Tamori ,  Masaaki Nojiri

IPC: G03F7/20 ,  G01B15/04 ,  G01N23/225

Abstract: The present invention has a computation device for measuring the dimensions of patterns formed on a sample on the basis of a signal obtained from a charged particle beam device. The computation device has a positional deviation amount calculation unit for calculating the amount of positional deviation in a direction parallel to a wafer surface between two patterns having different heights on the basis of an image acquired at a given beam tilt angle; a pattern inclination amount calculation unit for calculating an amount of pattern inclination from the amount of positional deviation using a predetermined relational expression for the amount of positional deviation and the amount of pattern inclination; and a beam tilt control amount calculation unit for controlling the beam tilt angle so as to match the amount of pattern inclination. The pattern measurement device sets the beam tilt angle to a calculated beam tilt angle, reacquires an image and measures the patterns.

公开(公告)号：US09245711B2

公开(公告)日：2016-01-26

申请号：US14613538

申请日：2015-02-04

Applicant: Hitachi High-Technologies Corporation

Inventor： Michio Hatano ,  Yusuke Abe ,  Zhigang Wang

IPC: G01N15/14 ,  H01J37/28 ,  H01J37/22

CPC classification number: H01J37/222 ,  H01J37/28 ,  H01J2237/2448 ,  H01J2237/24495

Abstract: In observation of a sample having a structure in its depth direction, a charged particle beam apparatus that can form an SEM image reflecting a sample shape at a desired depth by a single image acquisition while avoiding enlargement of the apparatus is provided. The apparatus has: an irradiation optical system for irradiating and scanning a charged particle beam generated from a charged particle source on the sample; a detection optical system having a detector that detects charged particles generated from the sample by the irradiation of the charged particle beam, and converts them into an electric signal at a predetermined sampling period; and an image processing unit for forming an image based on the electric signal from the detector, in which the image processing unit detects a peak of wave height values for each pixel from the electric signal at each sampling time, and forms the image based on the peak of the detected wave height values.

Abstract translation: 在观察具有其深度方向结构的样品时，提供了一种带电粒子束装置，其能够通过单次图像获取反映所需深度的样品形状，同时避免该装置的放大。 该装置具有：照射光学系统，用于对从样品上的带电粒子源产生的带电粒子束进行照射和扫描; 检测光学系统，具有检测器，其通过照射带电粒子束来检测从样品产生的带电粒子，并以预定的采样周期将其转换为电信号; 以及图像处理单元，用于基于来自检测器的电信号形成图像，其中图像处理单元在每个采样时间从电信号检测每个像素的波高值的峰值，并且基于 检测到的波高值的峰值。