发明授权
- 专利标题： Apparatus for manufacturing a mask
- 专利标题（中）： 用于制造面罩的装置
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申请号： US13440112申请日： 2012-04-05
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公开(公告)号： US09256124B2公开(公告)日： 2016-02-09
- 发明人: Jin-Seok Heo , Chang-Min Park , Seok-Hwan Oh , Jeong-Ho Yeo
- 申请人： Jin-Seok Heo , Chang-Min Park , Seok-Hwan Oh , Jeong-Ho Yeo
- 申请人地址： KR Suwon-si, Gyeonggi-do
- 专利权人： SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人： SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人地址： KR Suwon-si, Gyeonggi-do
- 代理机构： Lee & Morse, P.C.
- 优先权： KR10-2011-0030993 20110405
- 主分类号： B29C43/02
- IPC分类号： B29C43/02 ; G03F7/00 ; B82Y10/00 ; B82Y40/00
摘要：
A method of manufacturing a mask includes dividing an upper surface of a template having a design pattern into a plurality of regions, the template being arranged over a polymer layer on a mask substrate, correcting a distorted region among the regions, pressing the polymer layer with the template to form a mask pattern corresponding to the design pattern on the polymer layer; and curing the mask pattern.
公开/授权文献
- US20120257185A1 APPARATUS FOR MANUFACTURING A MASK 公开/授权日：2012-10-11