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    Photolithography method including technique of determining distribution of energy of exposure light passing through slit of exposure apparatus
    2.
    发明授权
    Photolithography method including technique of determining distribution of energy of exposure light passing through slit of exposure apparatus 有权
    光刻方法，包括确定通过曝光装置的狭缝的曝光光的能量分布的技术

    公开(公告)号：US08492058B2

    公开(公告)日：2013-07-23

    申请号：US13710643

    申请日：2012-12-11

    申请人： Jin-Seok Heo ,  Seok-Hwan Oh ,  Jeong-Ho Yeo

    发明人： Jin-Seok Heo ,  Seok-Hwan Oh ,  Jeong-Ho Yeo

    IPC分类号： G03F9/00

    CPC分类号： G03F7/20 ,  G03F7/70075 ,  G03F7/70133 ,  G03F7/70608 ,  G03F7/70616

    摘要： The energy distribution of exposure light directed passing through the slit of an exposure apparatus is determined. A photoresist layer on a substrate is exposed over a plurality of shots while changing the intensity of the exposure light for each shot. Then the photoresist layer is developed to form a sample photoresist layer. An image of the developed sample photoresist layer is analyzed for color intensity. Values of the color intensity across a selected one of the shots are correlated with values of the intensity of the exposure light to produce an energy distribution of the exposure light along the length of the slit. The energy distribution is used to change the slit so that a more desirable energy distribution may be realized when the slit is used in a process of manufacturing a semiconductor device.

    摘要翻译： 确定通过曝光装置的狭缝的曝光光的能量分布。 衬底上的光致抗蚀剂层在多次照射下曝光，同时改变每次射击的曝光光的强度。 然后将光致抗蚀剂层显影以形成样品光致抗蚀剂层。 分析显影样品光致抗蚀剂层的图像的颜色强度。 所选择的一个拍摄中的颜色强度的值与曝光光的强度的值相关，以产生沿着狭缝的长度的曝光光的能量分布。 使用能量分布来改变狭缝，使得当在制造半导体器件的工艺中使用狭缝时可以实现更理想的能量分布。

    Method of measuring an overlay of an object
    3.
    发明授权
    Method of measuring an overlay of an object 有权
    测量物体重叠的方法

    公开(公告)号：US08930011B2

    公开(公告)日：2015-01-06

    申请号：US13107166

    申请日：2011-05-13

    申请人： Jin-Seok Heo ,  Seok-Hwan Oh ,  Jeong-Ho Yeo

    发明人： Jin-Seok Heo ,  Seok-Hwan Oh ,  Jeong-Ho Yeo

    IPC分类号： G06F19/00 ,  H01L21/00 ,  G06K9/00 ,  G03F7/20

    CPC分类号： G03F7/70633

    摘要： A method of measuring an overlay of an object is provided. In the method, first information of a first structure may be obtained. A preliminary structure may be formed on the first structure. Second information of the preliminary structure may be obtained. The first information and the second information may be processed to obtain virtual information of a second structure that would be formed on the first structure if a process is performed on the preliminary structure. A virtual overlay between the first structure and the second structure may be measured using the virtual information.

    摘要翻译： 提供了一种测量物体的重叠的方法。 在该方法中，可以获得第一结构的第一信息。 可以在第一结构上形成初步结构。 可以获得初步结构的第二信息。 如果对初步结构执行处理，则可以处理第一信息和第二信息以获得将在第一结构上形成的第二结构的虚拟信息。 可以使用虚拟信息来测量第一结构和第二结构之间的虚拟覆盖。

    Photolithography method including technique of determining distribution of energy of exposure light passing through slit of exposure apparatus
    4.
    发明授权
    Photolithography method including technique of determining distribution of energy of exposure light passing through slit of exposure apparatus 有权
    光刻方法，包括确定通过曝光装置的狭缝的曝光光的能量分布的技术

    公开(公告)号：US08338063B2

    公开(公告)日：2012-12-25

    申请号：US13402902

    申请日：2012-02-23

    申请人： Jin-Seok Heo ,  Seok-Hwan Oh ,  Jeong-Ho Yeo

    发明人： Jin-Seok Heo ,  Seok-Hwan Oh ,  Jeong-Ho Yeo

    IPC分类号： G03F9/00

    CPC分类号： G03F7/20 ,  G03F7/70075 ,  G03F7/70133 ,  G03F7/70608 ,  G03F7/70616

    摘要： The energy distribution of exposure light directed passing through the slit of an exposure apparatus is determined. A photoresist layer on a substrate is exposed over a plurality of shots while changing the intensity of the exposure light for each shot. Then the photoresist layer is developed to form a sample photoresist layer. An image of the developed sample photoresist layer is analyzed for color intensity. Values of the color intensity across a selected one of the shots are correlated with values of the intensity of the exposure light to produce an energy distribution of the exposure light along the length of the slit. The energy distribution is used to change the slit so that a more desirable energy distribution may be realized when the slit is used in a process of manufacturing a semiconductor device.

    摘要翻译： 确定通过曝光装置的狭缝的曝光光的能量分布。 衬底上的光致抗蚀剂层在多次照射下曝光，同时改变每次射击的曝光光的强度。 然后将光致抗蚀剂层显影以形成样品光致抗蚀剂层。 分析显影样品光致抗蚀剂层的图像的颜色强度。 所选择的一个拍摄中的颜色强度的值与曝光光的强度的值相关，以产生沿着狭缝的长度的曝光光的能量分布。 使用能量分布来改变狭缝，使得当在制造半导体器件的工艺中使用狭缝时可以实现更理想的能量分布。

    METHOD OF MEASURING AN OVERLAY OF AN OBJECT
    5.
    发明申请
    METHOD OF MEASURING AN OVERLAY OF AN OBJECT 有权
    测量对象覆盖的方法

    公开(公告)号：US20110320025A1

    公开(公告)日：2011-12-29

    申请号：US13107166

    申请日：2011-05-13

    申请人： Jin-Seok Heo ,  Seok-Hwan Oh ,  Jeong-Ho Yeo

    发明人： Jin-Seok Heo ,  Seok-Hwan Oh ,  Jeong-Ho Yeo

    IPC分类号： G06F17/50

    CPC分类号： G03F7/70633

    摘要： A method of measuring an overlay of an object is provided. In the method, first information of a first structure may be obtained. A preliminary structure may be formed on the first structure. Second information of the preliminary structure may be obtained. The first information and the second information may be processed to obtain virtual information of a second structure that would be formed on the first structure if a process is performed on the preliminary structure. A virtual overlay between the first structure and the second structure may be measured using the virtual information.

    摘要翻译： 提供了一种测量物体的重叠的方法。 在该方法中，可以获得第一结构的第一信息。 可以在第一结构上形成初步结构。 可以获得初步结构的第二信息。 如果对初步结构执行处理，则可以处理第一信息和第二信息以获得将在第一结构上形成的第二结构的虚拟信息。 可以使用虚拟信息来测量第一结构和第二结构之间的虚拟覆盖。

    METHOD OF MEASURING FOCAL VARIATIONS OF A PHOTOLITHOGRAPHY APPARATUS AND A METHOD OF FABRICATING A SEMICONDUCTOR DEVICE USING THE FOCAL VARIATIONS MEASURING METHOD
    7.
    发明申请
    METHOD OF MEASURING FOCAL VARIATIONS OF A PHOTOLITHOGRAPHY APPARATUS AND A METHOD OF FABRICATING A SEMICONDUCTOR DEVICE USING THE FOCAL VARIATIONS MEASURING METHOD 审中-公开
    测量光刻设备的焦点变化的方法和使用焦点变化测量方法来制造半导体器件的方法

    公开(公告)号：US20110116705A1

    公开(公告)日：2011-05-19

    申请号：US12862430

    申请日：2010-08-24

    申请人： Jin-Seok Heo ,  Jeong-Ho Yeo

    发明人： Jin-Seok Heo ,  Jeong-Ho Yeo

    IPC分类号： G06T7/00

    CPC分类号： G01N21/9501 ,  G03F7/70641

    摘要： Provided are a method of measuring focal variations of a photolithography apparatus and a method of fabricating a semiconductor device using the method. The method of measuring the focal variations of the photolithography apparatus includes loading a photomask and a wafer into the photolithography apparatus. The photomask has an optical pattern, and the wafer has a photoresist layer on a top surface thereof. An image of the optical pattern is transferred to the photoresist layer using ultraviolet (UV) light. The photoresist layer is baked. The photoresist layer is inspected. Inspection results of the photoresist layer are analyzed. The inspection of the photoresist layer includes irradiating light for measurement to the entire surface of the wafer. Light reflected and diffracted by the wafer is collected to form an optical image. The analysis of the inspection results of the photoresist layer includes analyzing optical information on the optical image.

    摘要翻译： 提供了一种测量光刻设备的焦点变化的方法和使用该方法制造半导体器件的方法。 测量光刻设备的焦点变化的方法包括将光掩模和晶片加载到光刻设备中。 光掩模具有光学图案，并且晶片在其顶表面上具有光致抗蚀剂层。 使用紫外（UV）光将光学图案的图像转印到光致抗蚀剂层。 光刻胶层被烘烤。 检查光致抗蚀剂层。 分析光致抗蚀剂层的检查结果。 光致抗蚀剂层的检查包括将光照射到晶片的整个表面进行测量。 收集由晶片反射和衍射的光以形成光学图像。 对光致抗蚀剂层的检查结果的分析包括分析光学图像上的光学信息。

    Cell voltage measuring apparatus and method of battery pack having multiplexers to output voltage signal of each cell
    8.
    发明授权
    Cell voltage measuring apparatus and method of battery pack having multiplexers to output voltage signal of each cell 有权
    具有多路复用器的电池组的电池电压测量装置和方法，用于输出每个电池的电压信号

    公开(公告)号：US08860421B2

    公开(公告)日：2014-10-14

    申请号：US13050493

    申请日：2011-03-17

    申请人： Jin-Seok Heo ,  Jee-Ho Kim ,  Dal-Hoon Lee ,  Sang-Hoon Lee

    发明人： Jin-Seok Heo ,  Jee-Ho Kim ,  Dal-Hoon Lee ,  Sang-Hoon Lee

    IPC分类号： G01N27/416 ,  G01R31/36 ,  G01R19/165 ,  H01M10/48

    CPC分类号： G01R31/3658 ,  B60L11/1855 ,  B60L11/1859 ,  B60L11/1866 ,  G01R19/16542 ,  G01R31/362 ,  H01M10/48 ,  H02J7/0021 ,  Y02T10/7005 ,  Y02T10/7061

    摘要： A cell voltage measuring apparatus of a battery pack comprises a plurality of multiplexers connected corresponding to each cell group of the battery pack and operated to output a voltage signal of each cell in each cell group based on a reference potential applied from a corresponding cell group; a plurality of floating capacitors connected corresponding to each cell in each cell group and on which the voltage of each cell is charged and held; a switching means for enabling the voltage of each cell to be charged and held on each corresponding floating capacitor; and a controller for controlling the switching means per each cell group to enable the voltage of each cell to be charged and held on each corresponding floating capacitor and controlling each multiplexer to measure the cell voltage held on each floating capacitor of each cell group connected to each corresponding multiplexer.

    摘要翻译： 电池组的电池电压测量装置包括对应于电池组的每个电池组连接的多个多路复用器，并且被操作以基于从相应的电池组施加的参考电位输出每个电池组中的每个电池单元的电压信号; 与每个单元组中的每个单元对应地连接的多个浮置电容器，并且在每个单元组中对每个单元的电压进行充电和保持; 开关装置，用于使每个电池的电压被充电并保持在每个对应的浮动电容器上; 以及控制器，用于控制每个单元组的开关装置，以使每个单元的电压被充电并保持在每个相应的浮动电容器上，并且控制每个多路复用器以测量保持在每个单元组连接的每个单元组的每个浮置电容器上的单元电压 相应的多路复用器。

    Apparatus and system for generating extreme ultraviolet light and method of using the same
    9.
    发明授权
    Apparatus and system for generating extreme ultraviolet light and method of using the same 有权
    用于产生极紫外光的装置和系统及其使用方法

    公开(公告)号：US09544985B2

    公开(公告)日：2017-01-10

    申请号：US14803920

    申请日：2015-07-20

    申请人： Jin-Seok Heo ,  Jin-Hong Park

    发明人： Jin-Seok Heo ,  Jin-Hong Park

    IPC分类号： A61N5/06 ,  H05G2/00 ,  G21K1/06 ,  G03F7/20 ,  B05B12/12

    CPC分类号： H05G2/008 ,  B05B12/12 ,  G03F7/70033 ,  G21K1/067 ,  G21K2201/064 ,  G21K2201/065 ,  H05G2/005

    摘要： Provided is an apparatus for generating extreme ultraviolet light. The apparatus includes a collector mirror unit, a gas supply unit configured to supply a processing gas to the collector mirror unit, a gas supply nozzle arranged in at least one area of the collector mirror unit and configured to supply the processing gas to a surface of the collector mirror unit, and a controller configured to adjust a shape of a spray hole of the gas supply nozzle. The shape of the spray hole may be changed according to a control operation of the controller.

    摘要翻译： 提供一种用于产生极紫外光的装置。 该装置包括收集反射镜单元，被配置为向收集反射镜单元供应处理气体的气体供给单元，设置在收集反射镜单元的至少一个区域中并被配置为将处理气体供应到 收集器反射镜单元和被配置为调节气体供应喷嘴的喷射孔的形状的控制器。 可以根据控制器的控制操作来改变喷孔的形状。

    Apparatus and System for Generating Extreme Ultraviolet Light and Method of Using the Same
    10.
    发明申请
    Apparatus and System for Generating Extreme Ultraviolet Light and Method of Using the Same 有权
    用于产生极紫外光的装置和系统及其使用方法

    公开(公告)号：US20160143122A1

    公开(公告)日：2016-05-19

    申请号：US14803920

    申请日：2015-07-20

    申请人： Jin-Seok Heo ,  Jin-Hong Park

    发明人： Jin-Seok Heo ,  Jin-Hong Park

    IPC分类号： H05G2/00 ,  G03F7/20 ,  B05B12/12 ,  G21K1/06

    CPC分类号： H05G2/008 ,  B05B12/12 ,  G03F7/70033 ,  G21K1/067 ,  G21K2201/064 ,  G21K2201/065 ,  H05G2/005

    摘要： Provided is an apparatus for generating extreme ultraviolet light. The apparatus includes a collector mirror unit, a gas supply unit configured to supply a processing gas to the collector mirror unit, a gas supply nozzle arranged in at least one area of the collector mirror unit and configured to supply the processing gas to a surface of the collector mirror unit, and a controller configured to adjust a shape of a spray hole of the gas supply nozzle. The shape of the spray hole may be changed according to a control operation of the controller.

    摘要翻译： 提供一种用于产生极紫外光的装置。 该装置包括收集反射镜单元，被配置为向收集反射镜单元供应处理气体的气体供给单元，设置在收集反射镜单元的至少一个区域中并被配置为将处理气体供应到 收集器反射镜单元和被配置为调节气体供应喷嘴的喷射孔的形状的控制器。 可以根据控制器的控制操作来改变喷孔的形状。