Invention Grant
- Patent Title: Semiconductor ESD device and method of making same
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Application No.: US14606861Application Date: 2015-01-27
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Publication No.: US09263430B2Publication Date: 2016-02-16
- Inventor: Krzysztof Domanski , Cornelius Christian Russ , Kai Esmark
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01L27/00
- IPC: H01L27/00 ; H01L27/02 ; H01L29/74 ; H01L21/82

Abstract:
A semiconductor device includes an SCR ESD device region disposed within a semiconductor body, and a plurality of first device regions of the first conductivity type disposed on a second device region of the second conductivity type, where the second conductivity type is opposite the first conductivity type. Also included is a plurality of third device regions having a sub-region of the first conductivity type and a sub-region of the second conductivity type disposed on the second device region. The first regions and second regions are distributed such that the third regions are not directly adjacent to each other. A fourth device region of the first conductivity type adjacent to the second device region and a fifth device region of the second conductivity type disposed within the fourth device region are also included.
Public/Granted literature
- US20150144996A1 Semiconductor ESD Device and Method of Making Same Public/Granted day:2015-05-28
Information query
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