发明授权
US09267902B2 Method of analyzing sample using secondary ion emitted from sample and analyzer for performing analysis method
有权
使用从样品和分析仪发射的二次离子分析样品进行分析方法的方法
- 专利标题： Method of analyzing sample using secondary ion emitted from sample and analyzer for performing analysis method
- 专利标题（中）： 使用从样品和分析仪发射的二次离子分析样品进行分析方法的方法
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申请号： US13979144申请日： 2012-01-12
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公开(公告)号： US09267902B2公开(公告)日： 2016-02-23
- 发明人: Manabu Komatsu , Masafumi Kyogaku , Hiroyuki Hashimoto , Naofumi Aoki
- 申请人： Manabu Komatsu , Masafumi Kyogaku , Hiroyuki Hashimoto , Naofumi Aoki
- 申请人地址： JP Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JP Tokyo
- 代理机构： Fitzpatrick, Cella, Harper & Scinto
- 优先权： JP2011-006094 20110114; JP2011-251621 20111117
- 国际申请： PCT/JP2012/051011 WO 20120112
- 国际公布： WO2012/096412 WO 20120719
- 主分类号： H01J49/00
- IPC分类号： H01J49/00 ; G01N23/22 ; H01J49/04 ; H01J49/14
摘要：
Provided is a sample analysis method of irradiating a sample with a primary ion beam to analyze a secondary ion emitted from the sample by mass spectrometry, the sample analysis method including the steps of cooling a sample placed in a chamber; forming an ice layer on a surface of the cooled sample by discharging one of water and an aqueous solution to the chamber; and irradiating the surface of the sample with the primary ion beam with the ice layer being formed thereon, wherein an amount of the water forming the ice layer is 0.1 ng/mm2 or more and 20 ng/mm2 or less.
公开/授权文献
- US20130320204A1 SAMPLE ANALYSIS METHOD AND ANALYZER 公开/授权日：2013-12-05
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