Invention Grant
US09267902B2 Method of analyzing sample using secondary ion emitted from sample and analyzer for performing analysis method
有权
使用从样品和分析仪发射的二次离子分析样品进行分析方法的方法
- Patent Title: Method of analyzing sample using secondary ion emitted from sample and analyzer for performing analysis method
- Patent Title (中): 使用从样品和分析仪发射的二次离子分析样品进行分析方法的方法
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Application No.: US13979144Application Date: 2012-01-12
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Publication No.: US09267902B2Publication Date: 2016-02-23
- Inventor: Manabu Komatsu , Masafumi Kyogaku , Hiroyuki Hashimoto , Naofumi Aoki
- Applicant: Manabu Komatsu , Masafumi Kyogaku , Hiroyuki Hashimoto , Naofumi Aoki
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2011-006094 20110114; JP2011-251621 20111117
- International Application: PCT/JP2012/051011 WO 20120112
- International Announcement: WO2012/096412 WO 20120719
- Main IPC: H01J49/00
- IPC: H01J49/00 ; G01N23/22 ; H01J49/04 ; H01J49/14
Abstract:
Provided is a sample analysis method of irradiating a sample with a primary ion beam to analyze a secondary ion emitted from the sample by mass spectrometry, the sample analysis method including the steps of cooling a sample placed in a chamber; forming an ice layer on a surface of the cooled sample by discharging one of water and an aqueous solution to the chamber; and irradiating the surface of the sample with the primary ion beam with the ice layer being formed thereon, wherein an amount of the water forming the ice layer is 0.1 ng/mm2 or more and 20 ng/mm2 or less.
Public/Granted literature
- US20130320204A1 SAMPLE ANALYSIS METHOD AND ANALYZER Public/Granted day:2013-12-05
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