Invention Grant
- Patent Title: Substrate treating apparatus and substrate treating method
- Patent Title (中): 基板处理装置及基板处理方法
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Application No.: US13905754Application Date: 2013-05-30
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Publication No.: US09275852B2Publication Date: 2016-03-01
- Inventor: KiBong Kim , Boong Kim , Gil Hun Song , Oh Jin Kwon
- Applicant: Semes Co., Ltd.
- Applicant Address: KR Chungcheongnam-do
- Assignee: Semes Co., Ltd.
- Current Assignee: Semes Co., Ltd.
- Current Assignee Address: KR Chungcheongnam-do
- Agency: Harness, Dickey & Pierce
- Priority: KR10-2012-0058228 20120531; KR10-2012-0093798 20120827
- Main IPC: H01L21/00
- IPC: H01L21/00 ; B08B3/04 ; F26B5/00 ; H01L21/02 ; F26B21/14 ; H01L21/67 ; B08B7/00 ; F26B21/12

Abstract:
Provided is an apparatus for treating a substrate using a supercritical fluid. The substrate treating apparatus includes a housing, a support member disposed within the housing to support the substrate, a supercritical fluid supply unit in which the supercritical fluid is stored, a supply tube connecting the supercritical fluid supply unit to the housing to adjust an amount of supercritical fluid supplied from the supercritical fluid supply unit into the housing, and a vent tube branched from the supply tube to discharge the supercritical fluid remaining in the supply tube. A switching valve opening or closing the vent tube is disposed in the vent tube.
Public/Granted literature
- US20130318815A1 SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD Public/Granted day:2013-12-05
Information query
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