公开(公告)号：US20250069908A1

公开(公告)日：2025-02-27

申请号：US18779123

申请日：2024-07-22

Applicant: SEMES CO., LTD.

Inventor： Youngjoon Han ,  Kyuhwan Chang ,  Juha Woo

IPC: H01L21/67 ,  B05B1/26

Abstract: A substrate processing apparatus includes a support unit configured to support a substrate and be rotatable, a chemical liquid supply nozzle configured to supply a chemical liquid to a chemical liquid supply area of the substrate, and a charging unit disposed adjacent to the substrate. The charging unit is disposed adjacent to the chemical liquid supply nozzle, and is charged with charges opposite to charges of the chemical liquid.

公开(公告)号：US20250068080A1

公开(公告)日：2025-02-27

申请号：US18743089

申请日：2024-06-13

Applicant: SEMES CO., LTD.

Inventor： Kyung Taek IM ,  Jae Ha KIM ,  Seung Hwan LEE ,  Seung Jun LEE

IPC: G03F7/38 ,  H01L21/67

Abstract: Provided is a substrate treatment apparatus including: a cooling chamber accommodating a substrate; and a cooling unit disposed inside the cooling chamber, the cooling unit including a support, two first plates connected to the support to support the substrate and spaced apart from each other in a height direction of the support, and a second plate disposed to move up and down between the two first plates.

公开(公告)号：US12235663B2

公开(公告)日：2025-02-25

申请号：US17742281

申请日：2022-05-11

Applicant: SEMES CO., LTD.

Inventor： Myung Hwan Eom ,  Sang Hyun Son ,  Jae Hong Kim

IPC: G05D7/06 ,  G01F1/667 ,  G05B19/416

Abstract: A flow rate control apparatus with improved reliability is provided. The flow rate control apparatus comprises a flow rate measuring unit for measuring a flow rate of chemical solution in a chemical solution supply line, a flow rate control unit for comparing a preset target flow rate profile and an applied flow rate profile, and controlling the flow rate of the chemical solution so that the applied flow rate profile matches the target flow rate profile, and a processor for switching the flow rate control unit to a first mode in response to a signal for the flow rate of the chemical solution measured by the flow rate measuring unit being less than a preset level, wherein, in the first mode, the applied flow rate profile includes a profile of a flow rate estimation model simulated using a flow rate of chemical solution measured by the flow rate measuring unit.

公开(公告)号：US12230516B2

公开(公告)日：2025-02-18

申请号：US17515737

申请日：2021-11-01

Applicant: SEMES CO., LTD.

Inventor： Jae Oh Bang ,  Young Seo An ,  Seung Han Lee ,  Seung Hwan Lee ,  Hyun Min Kim

IPC: H01L21/67 ,  F27B17/00 ,  F27D7/02 ,  F27D99/00 ,  H01L21/324 ,  H01L21/66 ,  F27D5/00 ,  F27D19/00

Abstract: The inventive concept relates to a substrate treating apparatus including a process chamber having a first and a second body, a support unit supporting a substrate, a heating unit heats the substrate, a driver moves any one of the first body and the second body, an interval state detection unit that detects an interval state between a side wall of the first body and a side wall of the second body when the first and the second body are placed in a process location, and a controller that controls the driver and the interval state detection unit, wherein the interval state detection unit includes a pressure provision line that provides a positive pressure or a negative pressure between the side wall of the first body and the side wall of the second body, and a pressure measurement member that measures a change in a pressure of the pressure provision line.

公开(公告)号：US12221296B2

公开(公告)日：2025-02-11

申请号：US18458252

申请日：2023-08-30

Applicant: SEMES CO., LTD.

Inventor： Ho Chul Choi

IPC: B65G49/06 ,  B65G47/91 ,  H01L21/677

Abstract: Provided is a substrate processing apparatus and method capable of controlling a gripper to stably suck a substrate even when the substrate is deformed, the substrate processing apparatus including a floating stage for floating a substrate, lift pins liftably mounted in the floating stage, a substrate aligner for aligning the substrate floated from the floating stage, a gripper for vacuum-sucking the aligned substrate, and a controller capable of controlling a floating height of the substrate, wherein the controller reduces the floating height of the substrate when the gripper fails to vacuum-suck the substrate.

公开(公告)号：US20250046631A1

公开(公告)日：2025-02-06

申请号：US18792709

申请日：2024-08-02

Applicant: SEMES CO., LTD.

Inventor： Young Hun LEE ,  Do Hyeon YOON ,  Eun Seok KIM

IPC: H01L21/67 ,  H01L21/677

Abstract: Disclosed is a substrate treating apparatus including: a treating chamber for treating a substrate; a transfer unit for loading and unloading the substrate into and from a treatment space in which the substrate is treated in the treating chamber; and a heating unit provided to be loaded into and unloaded from the treatment space, and for cleaning the treatment space by heating, in which the treating chamber includes: a chamber body providing the treatment space; and a support unit for supporting the substrate within the treatment space; and a fluid supply unit for supplying a fluid, which treats the substrate, into the treatment space, and the heating unit includes: a base; and a heater installed on the base.

公开(公告)号：US12217553B2

公开(公告)日：2025-02-04

申请号：US17564685

申请日：2021-12-29

Applicant: SEMES CO., LTD.

Inventor： Tae In Kim ,  Hyun Joon Yoon ,  Tae Uk Park

IPC: G07C5/00 ,  B60W40/12 ,  B60W50/02 ,  G05B19/418 ,  G07C5/08

Abstract: A transport vehicle management method includes self-testing a transport vehicle to determine whether there is an abnormality in the transport vehicle, checking whether the transport vehicle is capable of self-correcting the abnormality when the abnormality is detected in the transport vehicle, and self-correcting the abnormality when the transport vehicle is capable of self-correcting the abnormality.

公开(公告)号：US20250029851A1

公开(公告)日：2025-01-23

申请号：US18607481

申请日：2024-03-17

Applicant: SEMES CO., LTD.

Inventor： Tae Sung KIM ,  Duk Hyun SON ,  Kwang Pyo LEE

IPC: H01L21/67 ,  B08B9/032

Abstract: Proposed are a substrate processing system and a process gas supply control verification method and, more particularly, to a technology to verify the operation of a mass flow controller (MFC) that supplies a process gas for semiconductor processing at an appropriate flow rate according to a recipe.

公开(公告)号：US12207362B2

公开(公告)日：2025-01-21

申请号：US17534329

申请日：2021-11-23

Applicant: SEMES CO., LTD.

Inventor： Chung Woo Lee ,  In Kyu Park ,  Yong Seok Jang ,  Sung Youn Jeon

IPC: H01J37/32 ,  H05B1/02

Abstract: A support unit may include a plurality of heaters disposed in a matrix form in the support unit to heat a substrate, and a power supply unit for supplying power to the plurality of heaters, wherein a current applied to the plurality of heaters is controlled by switches connected to rows and columns of the matrix, respectively, and the switches connected to the rows of the matrix include first switches capable of controlling the current applied to the rows of the matrix and second switches connected in parallel with the first switches.

公开(公告)号：US12205837B2

公开(公告)日：2025-01-21

申请号：US17704195

申请日：2022-03-25

Applicant: SEMES CO., LTD.

Inventor： Seong Hyun Yun ,  Jung Heum Nam

IPC: H01L21/67 ,  B65G47/90 ,  H01J37/32 ,  H01L21/677 ,  H01L21/687

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a process chamber configured to treat a substrate; a transfer assembly configured to transfer the substrate to the process chamber; and a diagnosis unit configured to detect an abnormal state of the transfer assembly, and wherein the transfer assembly comprises: a housing having a transfer space; and a transfer robot configured to transfer the substrate to the process chamber, and wherein the diagnosis unit comprises: a detection member for detecting an air vibration generated within the housing; and a diagnosis member for diagnosing a driving unit of the transfer assembly based on the air vibration detected by the detection member.