Invention Grant
- Patent Title: Fabrication process and layout for magnetic sensor arrays
- Patent Title (中): 磁传感器阵列的制造工艺和布局
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Application No.: US14521213Application Date: 2014-10-22
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Publication No.: US09276200B2Publication Date: 2016-03-01
- Inventor: Phillip Mather , Jon Slaughter , Nicholas Rizzo
- Applicant: Everspin Technologies, Inc.
- Applicant Address: US AZ Chandler
- Assignee: EVERSPIN TECHNOLOGIES, INC.
- Current Assignee: EVERSPIN TECHNOLOGIES, INC.
- Current Assignee Address: US AZ Chandler
- Agency: Bookoff McAndrews, PLLC
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L43/12 ; G01R33/09 ; H01L27/22 ; H01L43/08

Abstract:
A magnetic sensor includes a plurality of groups, each group comprising a plurality of magnetic tunnel junction (MTJ) devices having a plurality of conductors configured to couple the MTJ devices within one group in parallel and the groups in series enabling independent optimization of the material resistance area (RA) of the MTJ and setting total device resistance so that the total bridge resistance is not so high that Johnson noise becomes a signal limiting concern, and yet not so low that CMOS elements may diminish the read signal. Alternatively, the magnetic tunnel junction devices within each of at least two groups in series and the at least two groups in parallel resulting in the individual configuration of the electrical connection path and the magnetic reference direction of the reference layer, leading to independent optimization of both functions, and more freedom in device design and layout. The X and Y pitch of the sense elements are arranged such that the line segment that stabilizes, for example, the right side of one sense element; also stabilizes the left side of the adjacent sense element.
Public/Granted literature
- US20150044782A1 FABRICATION PROCESS AND LAYOUT FOR MAGNETIC SENSOR ARRAYS Public/Granted day:2015-02-12
Information query
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